AU475272B2 - Glow discharge method and apparatus - Google Patents
Glow discharge method and apparatusInfo
- Publication number
- AU475272B2 AU475272B2 AU46331/72A AU4633172A AU475272B2 AU 475272 B2 AU475272 B2 AU 475272B2 AU 46331/72 A AU46331/72 A AU 46331/72A AU 4633172 A AU4633172 A AU 4633172A AU 475272 B2 AU475272 B2 AU 475272B2
- Authority
- AU
- Australia
- Prior art keywords
- glow discharge
- discharge method
- glow
- discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17824871A | 1971-09-07 | 1971-09-07 | |
US178240A US3884793A (en) | 1971-09-07 | 1971-09-07 | Electrode type glow discharge apparatus |
USUS178248 | 1971-09-07 | ||
US25450472A | 1972-05-18 | 1972-05-18 | |
USUS254504 | 1972-05-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
AU4633172A AU4633172A (en) | 1974-03-14 |
AU475272B2 true AU475272B2 (en) | 1976-08-19 |
Family
ID=27390946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU46331/72A Expired AU475272B2 (en) | 1971-09-07 | 1972-09-05 | Glow discharge method and apparatus |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS5748637B2 (en) |
AU (1) | AU475272B2 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1435344A (en) * | 1973-08-31 | 1976-05-12 | Boc International Ltd | Sputtering apparatus |
JPS561723Y2 (en) * | 1975-02-03 | 1981-01-16 | ||
JPS5596164U (en) * | 1979-10-01 | 1980-07-03 | ||
JPS57161057A (en) * | 1981-03-30 | 1982-10-04 | Mitsubishi Electric Corp | Chemical vapor phase growth device using plasma |
JPS58147567A (en) * | 1982-02-24 | 1983-09-02 | Mitsubishi Heavy Ind Ltd | Anticorrosive for aluminum or aluminum alloy tank |
JPS58171569A (en) * | 1982-03-31 | 1983-10-08 | Hidetoshi Tsuchiya | Magnetron sputtering device |
US20050051422A1 (en) * | 2003-02-21 | 2005-03-10 | Rietzel James G. | Cylindrical magnetron with self cleaning target |
CN105659708B (en) * | 2013-11-22 | 2018-05-01 | 东丽株式会社 | Plasma electrode, corona treatment electrode, CVD electrodes, the manufacture method of plasma CVD equipment and membrane base material |
-
1972
- 1972-09-05 AU AU46331/72A patent/AU475272B2/en not_active Expired
- 1972-09-07 JP JP47089196A patent/JPS5748637B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
AU4633172A (en) | 1974-03-14 |
JPS4926184A (en) | 1974-03-08 |
JPS5748637B2 (en) | 1982-10-16 |
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