CA1006116A - Glow discharge method and apparatus - Google Patents

Glow discharge method and apparatus

Info

Publication number
CA1006116A
CA1006116A CA150,903A CA150903A CA1006116A CA 1006116 A CA1006116 A CA 1006116A CA 150903 A CA150903 A CA 150903A CA 1006116 A CA1006116 A CA 1006116A
Authority
CA
Canada
Prior art keywords
glow discharge
discharge method
glow
discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA150,903A
Other versions
CA150903S (en
Inventor
Alan S. Penfold
John A. Thornton
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Telic Corp
Original Assignee
Telic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Telic Corp filed Critical Telic Corp
Priority to CA223,970A priority Critical patent/CA984335A/en
Priority to CA223,969A priority patent/CA1009180A/en
Application granted granted Critical
Publication of CA1006116A publication Critical patent/CA1006116A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
CA150,903A 1971-09-07 1972-09-05 Glow discharge method and apparatus Expired CA1006116A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CA223,970A CA984335A (en) 1971-09-07 1975-04-07 Glow discharge method and apparatus
CA223,969A CA1009180A (en) 1971-09-07 1975-04-07 Glow discharge method and apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US178240A US3884793A (en) 1971-09-07 1971-09-07 Electrode type glow discharge apparatus
US25450472A 1972-05-18 1972-05-18

Publications (1)

Publication Number Publication Date
CA1006116A true CA1006116A (en) 1977-03-01

Family

ID=26874127

Family Applications (1)

Application Number Title Priority Date Filing Date
CA150,903A Expired CA1006116A (en) 1971-09-07 1972-09-05 Glow discharge method and apparatus

Country Status (8)

Country Link
US (1) US3884793A (en)
CA (1) CA1006116A (en)
CH (1) CH589940A5 (en)
DE (3) DE2264436A1 (en)
FR (2) FR2152633B1 (en)
GB (2) GB1420061A (en)
IL (1) IL40285A (en)
NL (1) NL7211911A (en)

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US4525264A (en) * 1981-12-07 1985-06-25 Ford Motor Company Cylindrical post magnetron sputtering system
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US4525262A (en) * 1982-01-26 1985-06-25 Materials Research Corporation Magnetron reactive bias sputtering method and apparatus
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DE3427587A1 (en) * 1984-07-26 1986-02-06 Leybold-Heraeus GmbH, 5000 Köln SPRAYING DEVICE FOR CATODE SPRAYING SYSTEMS
DE3442208C3 (en) * 1984-11-19 1998-06-10 Leybold Ag Method and device for producing hard carbon layers
US4711767A (en) * 1985-02-05 1987-12-08 Psi Star Plasma reactor with voltage transformer
US4600563A (en) * 1985-02-05 1986-07-15 Psi Star Incorporated Plasma reactor with voltage transformer
DE3527626A1 (en) * 1985-08-01 1987-02-05 Leybold Heraeus Gmbh & Co Kg SPRAYING CATODE ACCORDING TO THE MAGNETRON PRINCIPLE
US4668338A (en) * 1985-12-30 1987-05-26 Applied Materials, Inc. Magnetron-enhanced plasma etching process
DE3636524A1 (en) * 1986-10-27 1988-04-28 Vtu Angel Kancev Apparatus for applying coatings in a vacuum by magnetron atomisation
DE3727901A1 (en) * 1987-08-21 1989-03-02 Leybold Ag SPRAYING CATHODE ACCORDING TO THE MAGNETRON PRINCIPLE
BE1001027A3 (en) * 1987-10-21 1989-06-13 Bekaert Sa Nv METHOD AND DEVICE FOR CLEANING an elongated metal substrate such as a wire, A BAND, A CORD, ETC., AND ACCORDING TO THAT METHOD AND CLEANED SUBSTRATES WITH SUCH substrates ENHANCED OBJECTS OF POLYMER MATERIAL.
JP2673807B2 (en) * 1987-10-30 1997-11-05 パイオニア株式会社 Method for manufacturing magneto-optical recording medium
US4842703A (en) * 1988-02-23 1989-06-27 Eaton Corporation Magnetron cathode and method for sputter coating
US4810347A (en) * 1988-03-21 1989-03-07 Eaton Corporation Penning type cathode for sputter coating
DE3844064A1 (en) * 1988-12-28 1990-07-05 Leybold Ag MAGNETRON PRINCIPLE CATALOG SPRAYING DEVICE WITH A HOLLOW CATODE AND A CYLINDRICAL TARGET
US4927515A (en) * 1989-01-09 1990-05-22 The Board Of Trustees Of The Leland Stanford Junior University Circular magnetron sputtering device
DE3908252C2 (en) * 1989-03-14 1996-06-20 Leybold Ag Atomizing cathode based on the magnetron principle
US4957605A (en) * 1989-04-17 1990-09-18 Materials Research Corporation Method and apparatus for sputter coating stepped wafers
US5178743A (en) * 1989-06-15 1993-01-12 Microelectronics And Computer Technology Corporation Cylindrical magnetron sputtering system
DE4018914C1 (en) * 1990-06-13 1991-06-06 Leybold Ag, 6450 Hanau, De
US5073245A (en) * 1990-07-10 1991-12-17 Hedgcoth Virgle L Slotted cylindrical hollow cathode/magnetron sputtering device
US5437778A (en) * 1990-07-10 1995-08-01 Telic Technologies Corporation Slotted cylindrical hollow cathode/magnetron sputtering device
DE4100291C1 (en) * 1991-01-08 1991-10-02 Leybold Ag, 6450 Hanau, De
AU664995B2 (en) * 1991-04-19 1995-12-14 Surface Solutions, Incorporated Method and apparatus for linear magnetron sputtering
GB2256085A (en) * 1991-05-13 1992-11-25 Integrated Plasma Ltd Plasma deposition and etching of substrates.
US5228963A (en) * 1991-07-01 1993-07-20 Himont Incorporated Hollow-cathode magnetron and method of making thin films
DE4135939A1 (en) * 1991-10-31 1993-05-06 Leybold Ag, 6450 Hanau, De SPRAYING CATHODE
DE4138793C2 (en) * 1991-11-26 2001-03-01 Leybold Ag Method and device for coating a substrate, in particular with electrically non-conductive layers
US5415757A (en) * 1991-11-26 1995-05-16 Leybold Aktiengesellschaft Apparatus for coating a substrate with electrically nonconductive coatings
US5685961A (en) * 1992-03-27 1997-11-11 P & D Medical Coatings, Inc. Method for fabrication of metallized medical devices
DE4333825C1 (en) * 1993-09-28 1995-02-23 Mat Gmbh Apparatus for coating elongated flexible products
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US6066242A (en) * 1998-06-10 2000-05-23 David A. Glocker Conical sputtering target
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US6440220B1 (en) * 1998-10-23 2002-08-27 Goodrich Corporation Method and apparatus for inhibiting infiltration of a reactive gas into porous refractory insulation
US6162298A (en) * 1998-10-28 2000-12-19 The B. F. Goodrich Company Sealed reactant gas inlet for a CVI/CVD furnace
US6193853B1 (en) 1999-02-25 2001-02-27 Cametoid Limited Magnetron sputtering method and apparatus
EP1063319B1 (en) 1999-06-04 2005-12-07 Goodrich Corporation Method and apparatus for cooling a CVI/CVD furnace
EP1065294B1 (en) 1999-06-04 2003-10-15 Goodrich Corporation Method and apparatus for pressure measurement in a CVI/CVD furnace
DE60013208T2 (en) 1999-06-04 2005-08-11 Goodrich Corp. Suzeptordeckel both for gas phase infiltration or coating and heat treatment
TW584905B (en) 2000-02-25 2004-04-21 Tokyo Electron Ltd Method and apparatus for depositing films
US6497803B2 (en) 2000-05-31 2002-12-24 Isoflux, Inc. Unbalanced plasma generating apparatus having cylindrical symmetry
US6551477B2 (en) 2000-09-25 2003-04-22 Isoflux, Inc. Interlocking cylindrical magnetron cathodes and targets
US6887356B2 (en) * 2000-11-27 2005-05-03 Cabot Corporation Hollow cathode target and methods of making same
US6759807B2 (en) 2002-04-04 2004-07-06 Veeco Instruments, Inc. Multi-grid ion beam source for generating a highly collimated ion beam
AT414215B (en) * 2003-02-12 2006-10-15 Peter Ziger ANNEX TO PLASMA PROCESSING
US20050288773A1 (en) * 2004-01-22 2005-12-29 Glocker David A Radiopaque coating for biomedical devices
JP2008504104A (en) * 2004-06-28 2008-02-14 イソフラックス・インコーポレイテッド Porous coating for biomedical implants
DE102007049735B4 (en) * 2006-10-17 2012-03-29 Von Ardenne Anlagentechnik Gmbh Supply end block for a tubular magnetron
US7938943B2 (en) * 2006-10-17 2011-05-10 Von Ardenne Anlagentechnic GmbH Supply end block for rotary magnetron
JP5467735B2 (en) * 2007-07-02 2014-04-09 東ソー株式会社 Cylindrical sputtering target
DE102008052217B3 (en) * 2008-10-17 2011-03-10 Johann Wolfgang Goethe-Universität Electrostatic ion compressor
US20140061039A1 (en) * 2012-09-05 2014-03-06 Applied Materials, Inc. Target cooling for physical vapor deposition (pvd) processing systems
CN105659708B (en) * 2013-11-22 2018-05-01 东丽株式会社 Plasma electrode, corona treatment electrode, CVD electrodes, the manufacture method of plasma CVD equipment and membrane base material
CA3063389C (en) 2019-12-02 2021-03-30 2S Water Incorporated Solution electrode glow discharge apparatus
CA3068769A1 (en) 2020-01-20 2021-07-20 2S Water Incorporated Liquid electrode tip
CN116057200B (en) * 2020-09-16 2024-09-10 株式会社爱发科 Driving block for rotary cathode unit

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US3282815A (en) * 1963-07-01 1966-11-01 Ibm Magnetic control of film deposition
US3282816A (en) * 1963-09-16 1966-11-01 Ibm Process of cathode sputtering from a cylindrical cathode
US3369991A (en) * 1965-01-28 1968-02-20 Ibm Apparatus for cathode sputtering including a shielded rf electrode
US3507774A (en) * 1967-06-02 1970-04-21 Nat Res Corp Low energy sputtering apparatus for operation below one micron pressure

Also Published As

Publication number Publication date
FR2168124B1 (en) 1976-12-03
NL7211911A (en) 1973-03-09
FR2168124A1 (en) 1973-08-24
IL40285A (en) 1976-01-30
FR2152633A1 (en) 1973-04-27
IL40285A0 (en) 1972-11-28
GB1420061A (en) 1976-01-07
US3884793A (en) 1975-05-20
DE2264436A1 (en) 1973-12-20
FR2152633B1 (en) 1978-06-02
DE2243708A1 (en) 1973-04-26
GB1420062A (en) 1976-01-07
CH589940A5 (en) 1977-07-29
DE2264437A1 (en) 1973-10-31

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