JPS4926184A - - Google Patents
Info
- Publication number
- JPS4926184A JPS4926184A JP8919672A JP8919672A JPS4926184A JP S4926184 A JPS4926184 A JP S4926184A JP 8919672 A JP8919672 A JP 8919672A JP 8919672 A JP8919672 A JP 8919672A JP S4926184 A JPS4926184 A JP S4926184A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17824871A | 1971-09-07 | 1971-09-07 | |
| US178240A US3884793A (en) | 1971-09-07 | 1971-09-07 | Electrode type glow discharge apparatus |
| US25450472A | 1972-05-18 | 1972-05-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4926184A true JPS4926184A (en) | 1974-03-08 |
| JPS5748637B2 JPS5748637B2 (en) | 1982-10-16 |
Family
ID=27390946
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47089196A Expired JPS5748637B2 (en) | 1971-09-07 | 1972-09-07 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS5748637B2 (en) |
| AU (1) | AU475272B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5064185A (en) * | 1973-08-31 | 1975-05-31 | ||
| JPS5197548U (en) * | 1975-02-03 | 1976-08-05 | ||
| JPS5596164U (en) * | 1979-10-01 | 1980-07-03 | ||
| JPS57161057A (en) * | 1981-03-30 | 1982-10-04 | Mitsubishi Electric Corp | Chemical vapor phase growth device using plasma |
| JPS58147567A (en) * | 1982-02-24 | 1983-09-02 | Mitsubishi Heavy Ind Ltd | Anticorrosive for aluminum or aluminum alloy tank |
| JPS58171569A (en) * | 1982-03-31 | 1983-10-08 | Hidetoshi Tsuchiya | Magnetron sputtering device |
| JP2008510066A (en) * | 2004-08-12 | 2008-04-03 | フォン アルデンヌ アンラジェンテクニック ゲーエムベーハー | Cylindrical magnetron with self-cleaning target |
| WO2015076162A1 (en) * | 2013-11-22 | 2015-05-28 | 東レ株式会社 | Plasma electrode, plasma processing electrode, cvd electrode, plasma cvd device, and method for manufacturing substrate with thin film |
-
1972
- 1972-09-05 AU AU46331/72A patent/AU475272B2/en not_active Expired
- 1972-09-07 JP JP47089196A patent/JPS5748637B2/ja not_active Expired
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5064185A (en) * | 1973-08-31 | 1975-05-31 | ||
| JPS5197548U (en) * | 1975-02-03 | 1976-08-05 | ||
| JPS561723Y2 (en) * | 1975-02-03 | 1981-01-16 | ||
| JPS5596164U (en) * | 1979-10-01 | 1980-07-03 | ||
| JPS57161057A (en) * | 1981-03-30 | 1982-10-04 | Mitsubishi Electric Corp | Chemical vapor phase growth device using plasma |
| JPS6124467B2 (en) * | 1981-03-30 | 1986-06-11 | Mitsubishi Electric Corp | |
| JPS58147567A (en) * | 1982-02-24 | 1983-09-02 | Mitsubishi Heavy Ind Ltd | Anticorrosive for aluminum or aluminum alloy tank |
| JPS58171569A (en) * | 1982-03-31 | 1983-10-08 | Hidetoshi Tsuchiya | Magnetron sputtering device |
| JPS6154112B2 (en) * | 1982-03-31 | 1986-11-20 | Hidetoshi Tsucha | |
| JP2008510066A (en) * | 2004-08-12 | 2008-04-03 | フォン アルデンヌ アンラジェンテクニック ゲーエムベーハー | Cylindrical magnetron with self-cleaning target |
| WO2015076162A1 (en) * | 2013-11-22 | 2015-05-28 | 東レ株式会社 | Plasma electrode, plasma processing electrode, cvd electrode, plasma cvd device, and method for manufacturing substrate with thin film |
| JPWO2015076162A1 (en) * | 2013-11-22 | 2017-03-16 | 東レ株式会社 | Plasma electrode, plasma processing electrode, CVD electrode, plasma CVD apparatus, and method of manufacturing substrate with thin film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5748637B2 (en) | 1982-10-16 |
| AU475272B2 (en) | 1976-08-19 |
| AU4633172A (en) | 1974-03-14 |