JPS6151036B2 - - Google Patents
Info
- Publication number
- JPS6151036B2 JPS6151036B2 JP54072874A JP7287479A JPS6151036B2 JP S6151036 B2 JPS6151036 B2 JP S6151036B2 JP 54072874 A JP54072874 A JP 54072874A JP 7287479 A JP7287479 A JP 7287479A JP S6151036 B2 JPS6151036 B2 JP S6151036B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- etching
- silicon oxide
- plasma etching
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 claims description 67
- 238000005530 etching Methods 0.000 claims description 38
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 26
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 26
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 24
- 229910052710 silicon Inorganic materials 0.000 claims description 24
- 239000010703 silicon Substances 0.000 claims description 24
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 18
- 229910001882 dioxygen Inorganic materials 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 15
- 238000001020 plasma etching Methods 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 12
- 150000002222 fluorine compounds Chemical class 0.000 claims description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 230000001590 oxidative effect Effects 0.000 claims description 6
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 claims description 4
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 2
- 150000002431 hydrogen Chemical class 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 description 10
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- -1 fluorine radicals Chemical class 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229960002050 hydrofluoric acid Drugs 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 150000004715 keto acids Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7287479A JPS55164077A (en) | 1979-06-08 | 1979-06-08 | Method for etching by gas plasma |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7287479A JPS55164077A (en) | 1979-06-08 | 1979-06-08 | Method for etching by gas plasma |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55164077A JPS55164077A (en) | 1980-12-20 |
| JPS6151036B2 true JPS6151036B2 (zh) | 1986-11-07 |
Family
ID=13501906
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7287479A Granted JPS55164077A (en) | 1979-06-08 | 1979-06-08 | Method for etching by gas plasma |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55164077A (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02129037U (zh) * | 1989-04-01 | 1990-10-24 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57190320A (en) * | 1981-05-20 | 1982-11-22 | Toshiba Corp | Dry etching method |
| JP2001196594A (ja) | 1999-08-31 | 2001-07-19 | Fujitsu Ltd | 薄膜トランジスタ、液晶表示用基板及びその製造方法 |
-
1979
- 1979-06-08 JP JP7287479A patent/JPS55164077A/ja active Granted
Non-Patent Citations (1)
| Title |
|---|
| J.VAC.SCI.TECHNOL.=1979 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02129037U (zh) * | 1989-04-01 | 1990-10-24 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55164077A (en) | 1980-12-20 |
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