JPS6150149B2 - - Google Patents

Info

Publication number
JPS6150149B2
JPS6150149B2 JP58005264A JP526483A JPS6150149B2 JP S6150149 B2 JPS6150149 B2 JP S6150149B2 JP 58005264 A JP58005264 A JP 58005264A JP 526483 A JP526483 A JP 526483A JP S6150149 B2 JPS6150149 B2 JP S6150149B2
Authority
JP
Japan
Prior art keywords
ultraviolet
lamp
substrate
pressure
reaction vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58005264A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59129770A (ja
Inventor
Kazuya Tanaka
Toshihiro Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Priority to JP526483A priority Critical patent/JPS59129770A/ja
Publication of JPS59129770A publication Critical patent/JPS59129770A/ja
Publication of JPS6150149B2 publication Critical patent/JPS6150149B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
JP526483A 1983-01-18 1983-01-18 光化学蒸着装置 Granted JPS59129770A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP526483A JPS59129770A (ja) 1983-01-18 1983-01-18 光化学蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP526483A JPS59129770A (ja) 1983-01-18 1983-01-18 光化学蒸着装置

Publications (2)

Publication Number Publication Date
JPS59129770A JPS59129770A (ja) 1984-07-26
JPS6150149B2 true JPS6150149B2 (enrdf_load_stackoverflow) 1986-11-01

Family

ID=11606366

Family Applications (1)

Application Number Title Priority Date Filing Date
JP526483A Granted JPS59129770A (ja) 1983-01-18 1983-01-18 光化学蒸着装置

Country Status (1)

Country Link
JP (1) JPS59129770A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS609875A (ja) * 1983-06-27 1985-01-18 Nec Corp 光化学反応装置
JPS6156279A (ja) * 1984-08-25 1986-03-20 Yasuo Tarui 成膜方法
DE3919538A1 (de) * 1989-06-15 1990-12-20 Asea Brown Boveri Beschichtungsvorrichtung
JP4628025B2 (ja) * 2004-06-24 2011-02-09 株式会社アルバック 熱ｃｖｄ装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5826658B2 (ja) * 1976-04-02 1983-06-04 富士通株式会社 気相成長装置
JPS56105480A (en) * 1980-01-25 1981-08-21 Mitsubishi Electric Corp Plasma etching method
JPS57112033A (en) * 1980-12-29 1982-07-12 Fujitsu Ltd Unit for chemical vapor growth
JPS57179851A (en) * 1981-04-30 1982-11-05 Tokyo Ohka Kogyo Co Ltd Formation of pattern

Also Published As

Publication number Publication date
JPS59129770A (ja) 1984-07-26

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