JPH0372712B2 - - Google Patents

Info

Publication number
JPH0372712B2
JPH0372712B2 JP59067515A JP6751584A JPH0372712B2 JP H0372712 B2 JPH0372712 B2 JP H0372712B2 JP 59067515 A JP59067515 A JP 59067515A JP 6751584 A JP6751584 A JP 6751584A JP H0372712 B2 JPH0372712 B2 JP H0372712B2
Authority
JP
Japan
Prior art keywords
gas
substrate
air supply
supply member
reaction vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59067515A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60212222A (ja
Inventor
Shinji Sugioka
Shinji Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Priority to JP6751584A priority Critical patent/JPS60212222A/ja
Publication of JPS60212222A publication Critical patent/JPS60212222A/ja
Publication of JPH0372712B2 publication Critical patent/JPH0372712B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/488—Protection of windows for introduction of radiation into the coating chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
JP6751584A 1984-04-06 1984-04-06 光化学反応装置 Granted JPS60212222A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6751584A JPS60212222A (ja) 1984-04-06 1984-04-06 光化学反応装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6751584A JPS60212222A (ja) 1984-04-06 1984-04-06 光化学反応装置

Publications (2)

Publication Number Publication Date
JPS60212222A JPS60212222A (ja) 1985-10-24
JPH0372712B2 true JPH0372712B2 (enrdf_load_stackoverflow) 1991-11-19

Family

ID=13347193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6751584A Granted JPS60212222A (ja) 1984-04-06 1984-04-06 光化学反応装置

Country Status (1)

Country Link
JP (1) JPS60212222A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2515775B2 (ja) * 1987-02-18 1996-07-10 株式会社日立製作所 表面処理方法および装置

Also Published As

Publication number Publication date
JPS60212222A (ja) 1985-10-24

Similar Documents

Publication Publication Date Title
US20100096569A1 (en) Ultraviolet-transmitting microwave reflector comprising a micromesh screen
JPH0620956A (ja) 光ｃｖｄ装置及び光ｃｖｄ法
JPS6260467B2 (enrdf_load_stackoverflow)
JPS6150150B2 (enrdf_load_stackoverflow)
JPH0372712B2 (enrdf_load_stackoverflow)
JPS60212220A (ja) 光化学反応装置
JPS5936927A (ja) 半導体気相成長装置
JPS60209248A (ja) 光化学反応装置
JPS6250553B2 (enrdf_load_stackoverflow)
JPS60209247A (ja) 光化学反応装置
JPS6152232B2 (enrdf_load_stackoverflow)
JP3064407B2 (ja) 光励起プロセス装置用光源
JPS6064426A (ja) 気相反応薄膜形成方法および装置
JPH09260251A (ja) Ｘ線リソグラフィ用マスクメンブレンの製造方法
JPH0334538A (ja) 光励起反応装置
JP3010065B2 (ja) 光励起プロセス装置
US4842828A (en) Apparatus for treating surface of object with ultraviolet rays and reaction gas
JPS60219728A (ja) 堆積膜の形成法
JPS62142772A (ja) マイクロ波プラズマｃｖｄ法による堆積膜形成装置
JPS61131419A (ja) 半導体製造装置
JPH04365318A (ja) 表面処理装置
JPS61188928A (ja) 光励起薄膜形成方法
JPS59145780A (ja) 光化学蒸着装置
JP3010066B2 (ja) 光励起プロセス装置
JPS60219732A (ja) 堆積膜の形成法