JPS6148265B2 - - Google Patents
Info
- Publication number
- JPS6148265B2 JPS6148265B2 JP54071900A JP7190079A JPS6148265B2 JP S6148265 B2 JPS6148265 B2 JP S6148265B2 JP 54071900 A JP54071900 A JP 54071900A JP 7190079 A JP7190079 A JP 7190079A JP S6148265 B2 JPS6148265 B2 JP S6148265B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- chip
- container
- chip support
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 25
- 239000000463 material Substances 0.000 claims description 4
- 239000000941 radioactive substance Substances 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 9
- 229910052710 silicon Inorganic materials 0.000 abstract description 9
- 239000010703 silicon Substances 0.000 abstract description 9
- 229910010293 ceramic material Inorganic materials 0.000 abstract description 3
- 239000000758 substrate Substances 0.000 abstract description 2
- 230000002285 radioactive effect Effects 0.000 abstract 4
- 230000000694 effects Effects 0.000 abstract 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- 239000000919 ceramic Substances 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 230000005855 radiation Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000005260 alpha ray Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
Classifications
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L2924/151—Die mounting substrate
- H01L2924/1515—Shape
- H01L2924/15153—Shape the die mounting substrate comprising a recess for hosting the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/15165—Monolayer substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16152—Cap comprising a cavity for hosting the device, e.g. U-shaped cap
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19043—Component type being a resistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
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- Microelectronics & Electronic Packaging (AREA)
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- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Toxicology (AREA)
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- High Energy & Nuclear Physics (AREA)
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Description
【発明の詳細な説明】
本発明は半導体装置、特に組立の構造に関す
る。従来、半導体装置は半導体チツプを絶縁性収
容器に封入し、必要な導電配線により外部リード
端子に接続して導出せしめた構造となつている。
る。従来、半導体装置は半導体チツプを絶縁性収
容器に封入し、必要な導電配線により外部リード
端子に接続して導出せしめた構造となつている。
かような絶縁性収容容器をセラミツクなどの材
料で形成せしめると、セラミツク材料より放射線
特にα線が照射され、半導体素子が例えばメモ
リ・セルである場合には記憶データを破壊する等
の不都合を生ずることが知られている。
料で形成せしめると、セラミツク材料より放射線
特にα線が照射され、半導体素子が例えばメモ
リ・セルである場合には記憶データを破壊する等
の不都合を生ずることが知られている。
これはセラミツク材料中にPPM単位で含有さ
れているウラニウムやトリウムが放射性崩壊する
際にα線を放出し、該α線が半導体チツプ表面の
メモリ・セルを透過するときに多数の電子−正孔
対を生成し、これが記憶データを狂わせ、いわゆ
るソフト・エラーを発生するものである。
れているウラニウムやトリウムが放射性崩壊する
際にα線を放出し、該α線が半導体チツプ表面の
メモリ・セルを透過するときに多数の電子−正孔
対を生成し、これが記憶データを狂わせ、いわゆ
るソフト・エラーを発生するものである。
この様なソフト・エラーは物理的欠陥ではない
ので永久的に生ずるものではないが、半導体装置
の信頼上からは致命的とも云える問題である。
ので永久的に生ずるものではないが、半導体装置
の信頼上からは致命的とも云える問題である。
従つてα線照射の防止を図ることが必要で、収
容容器に適切な工夫を施こすことが重要となつて
きた。
容容器に適切な工夫を施こすことが重要となつて
きた。
本発明はこの様な点に鑑みてなされたもので、
メモリ・セルなどの半導体素子表面への放射線特
にα線照射を遮蔽して、半導体素子の特性劣化を
防止することを目的とし、表面に半導体素子を備
えた半導体チツプと、表面に導電配線層を備え且
つ放射性物質を含まない材料からなるチツプ支持
台とを、互に表面を対向させて配置し、該チツプ
支持台を収容容器に接着し、チツプ支持台と収容
容器との電極間はボンデイングワイヤーで接続し
た構造としたことを特徴とするものである。
メモリ・セルなどの半導体素子表面への放射線特
にα線照射を遮蔽して、半導体素子の特性劣化を
防止することを目的とし、表面に半導体素子を備
えた半導体チツプと、表面に導電配線層を備え且
つ放射性物質を含まない材料からなるチツプ支持
台とを、互に表面を対向させて配置し、該チツプ
支持台を収容容器に接着し、チツプ支持台と収容
容器との電極間はボンデイングワイヤーで接続し
た構造としたことを特徴とするものである。
以下、本発明を図面を参照して一実施例により
説明する。
説明する。
第1図は本発明による半導体装置の構造断面図
であつて、図中1は半導体チツプ、2はシリコン
で作成されたチツプ支持台、3はセラミツク製収
容容器、4は同キヤツプ、5は外部リード端子、
7は前記セラミツク製収容容器3、同キヤツプ4
及び外部リード端子5を固定、封着する低融点ガ
ラスを示している。そして半導体チツプ1の表面
には金バンブ電極11が形成されており、シリコ
ン製チツプ支持台2の表面の導電配線層21に上
記の金バンブ電極を熱圧着させて、表面が互に対
向する様に配置形成され、又チツプ支持台2の背
面はセラミツク製収容容器3に金・シリコン半田
22で融着される。
であつて、図中1は半導体チツプ、2はシリコン
で作成されたチツプ支持台、3はセラミツク製収
容容器、4は同キヤツプ、5は外部リード端子、
7は前記セラミツク製収容容器3、同キヤツプ4
及び外部リード端子5を固定、封着する低融点ガ
ラスを示している。そして半導体チツプ1の表面
には金バンブ電極11が形成されており、シリコ
ン製チツプ支持台2の表面の導電配線層21に上
記の金バンブ電極を熱圧着させて、表面が互に対
向する様に配置形成され、又チツプ支持台2の背
面はセラミツク製収容容器3に金・シリコン半田
22で融着される。
第2図に第1図のA部詳細図を示しており、シ
リコン製チツプ支持台2は上記の様に背面を半田
付けしているが、表面では酸化シリコン又は窒化
シリコンからなる絶縁膜23上に導電配線層21
を形成してあり、該導電配線層21は下層にニツ
ケル、銅、クロム、チタンなどの薄膜21A、上
層に金薄膜21Bの二層で形成されている。
リコン製チツプ支持台2は上記の様に背面を半田
付けしているが、表面では酸化シリコン又は窒化
シリコンからなる絶縁膜23上に導電配線層21
を形成してあり、該導電配線層21は下層にニツ
ケル、銅、クロム、チタンなどの薄膜21A、上
層に金薄膜21Bの二層で形成されている。
一方、半導体チツプ1はメモリ・セル12の導
電配線層13の端部に金バンブ電極11が形成さ
れており、該金バンブ電極をシリコン製チツプ支
持台2の導電配線層21に適度の温度及び圧力を
加えることにより接着せしめている。
電配線層13の端部に金バンブ電極11が形成さ
れており、該金バンブ電極をシリコン製チツプ支
持台2の導電配線層21に適度の温度及び圧力を
加えることにより接着せしめている。
該導電配線層21とセラミツク製収容容器の導
電層31とは金線などのワイヤ・ボンデング6に
よつて結線し、外部リード端子5に導出せしめ
る。この様に配設すればメモリ・セルは半導体チ
ツプ基板とシリコン製チツプ支持台とのいずれも
高純度のシリコン材料に挾まれた構造となるため
に、たとえ収容容器がα線を放出しても、直進性
のあるα線に対して完全に遮蔽することができ
て、記憶データを破壊することはなくなる。
電層31とは金線などのワイヤ・ボンデング6に
よつて結線し、外部リード端子5に導出せしめ
る。この様に配設すればメモリ・セルは半導体チ
ツプ基板とシリコン製チツプ支持台とのいずれも
高純度のシリコン材料に挾まれた構造となるため
に、たとえ収容容器がα線を放出しても、直進性
のあるα線に対して完全に遮蔽することができ
て、記憶データを破壊することはなくなる。
上記例ではシリコンで作成されたチツプ支持台
を用いて説明したが、熱膨脹率が半導体チツプ及
び収容容器に近似して、放射性崩壊する物質が含
まれなければ如何なる他の材料でも構わない。
を用いて説明したが、熱膨脹率が半導体チツプ及
び収容容器に近似して、放射性崩壊する物質が含
まれなければ如何なる他の材料でも構わない。
以上の様に、本発明は従来と同様にセラミツク
製などの収容容器を用いても、半導体素子を放射
線に対して充分に遮蔽することが出来るので、半
導体装置の信頼度を向上させるのに極めて効果あ
るものである。
製などの収容容器を用いても、半導体素子を放射
線に対して充分に遮蔽することが出来るので、半
導体装置の信頼度を向上させるのに極めて効果あ
るものである。
更に、本発明にかかる半導体装置の構造は、公
知のワイヤーボンデイングを自動的におこなうこ
とができるから、コストアツプも少なく、高い信
頼性が得られる利点がある。
知のワイヤーボンデイングを自動的におこなうこ
とができるから、コストアツプも少なく、高い信
頼性が得られる利点がある。
第1図は本発明による半導体装置の構造断面
図、第2図は第1図の局部詳細図を示す。 図において、1は半導体チツプ、2はチツプ支
持台、3は収容容器で12は半導体素子(メモ
リ・セル)の配設領域である。
図、第2図は第1図の局部詳細図を示す。 図において、1は半導体チツプ、2はチツプ支
持台、3は収容容器で12は半導体素子(メモ
リ・セル)の配設領域である。
Claims (1)
- 1 表面に半導体素子を備えた半導体チツプと、
該半導体チツプ上の電極に対向する電極部とワイ
ヤーボンデイング部間に延在する表面導電配線層
を備え且つ放射性物質を含まない材料からなるチ
ツプ支持台とが、互に表面を対向させて配置さ
れ、該チツプ支持台が収容容器に接着されてな
り、且つ、該チツプ支持台と収容容器との電極間
がワイヤーボンデイングされてなる構造であるこ
とを特徴とする半導体装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7190079A JPS55163850A (en) | 1979-06-08 | 1979-06-08 | Semiconductor device |
DE8080301853T DE3070853D1 (en) | 1979-06-08 | 1980-06-03 | Semiconductor device having a soft-error preventing structure |
EP80301853A EP0021643B1 (en) | 1979-06-08 | 1980-06-03 | Semiconductor device having a soft-error preventing structure |
US06/469,833 US4580157A (en) | 1979-06-08 | 1983-03-02 | Semiconductor device having a soft-error preventing structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7190079A JPS55163850A (en) | 1979-06-08 | 1979-06-08 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55163850A JPS55163850A (en) | 1980-12-20 |
JPS6148265B2 true JPS6148265B2 (ja) | 1986-10-23 |
Family
ID=13473866
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7190079A Granted JPS55163850A (en) | 1979-06-08 | 1979-06-08 | Semiconductor device |
Country Status (4)
Country | Link |
---|---|
US (1) | US4580157A (ja) |
EP (1) | EP0021643B1 (ja) |
JP (1) | JPS55163850A (ja) |
DE (1) | DE3070853D1 (ja) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0028490B1 (en) * | 1979-11-02 | 1983-12-21 | BURROUGHS CORPORATION (a Michigan corporation) | Integrated circuit with alpha radiation shielding means |
FR2498814B1 (fr) * | 1981-01-26 | 1985-12-20 | Burroughs Corp | Boitier pour circuit integre, moyen pour le montage et procede de fabrication |
US4528212A (en) * | 1982-07-22 | 1985-07-09 | International Business Machines Corporation | Coated ceramic substrates for mounting integrated circuits |
FR2550009B1 (fr) * | 1983-07-29 | 1986-01-24 | Inf Milit Spatiale Aeronaut | Boitier de composant electronique muni d'un condensateur |
US4649424A (en) * | 1985-06-11 | 1987-03-10 | Beltronics Inc. | Grounding system for CCD imaging apparatus and the like |
FR2584863B1 (fr) * | 1985-07-12 | 1988-10-21 | Inf Milit Spatiale Aeronaut | Composant electronique durci vis-a-vis des radiations |
US4866498A (en) * | 1988-04-20 | 1989-09-12 | The United States Department Of Energy | Integrated circuit with dissipative layer for photogenerated carriers |
KR900019177A (ko) * | 1988-05-19 | 1990-12-24 | 야마자키 순페이 | 전기 장치 및 제조방법 |
FR2640428B1 (fr) * | 1988-12-09 | 1992-10-30 | Thomson Csf | Procede de durcissement vis-a-vis des rayonnements ionisants de composants electroniques actifs, et composants durcis de grandes dimensions |
US6172412B1 (en) | 1993-10-08 | 2001-01-09 | Stratedge Corporation | High frequency microelectronics package |
US6611054B1 (en) * | 1993-12-22 | 2003-08-26 | Honeywell Inc. | IC package lid for dose enhancement protection |
US5477009A (en) * | 1994-03-21 | 1995-12-19 | Motorola, Inc. | Resealable multichip module and method therefore |
US7646095B2 (en) * | 2003-09-30 | 2010-01-12 | Panasonic Corporation | Semiconductor device |
US8946874B2 (en) | 2011-01-25 | 2015-02-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | IC in-process solution to reduce thermal neutrons soft error rate |
US10109609B2 (en) | 2014-01-13 | 2018-10-23 | Infineon Technologies Austria Ag | Connection structure and electronic component |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5588356A (en) * | 1978-12-27 | 1980-07-04 | Hitachi Ltd | Semiconductor device |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH378423A (de) * | 1959-02-19 | 1964-06-15 | Telefunken Gmbh | Halbleiteranordnung vom Flächentyp |
US3257588A (en) * | 1959-04-27 | 1966-06-21 | Rca Corp | Semiconductor device enclosures |
US3710204A (en) * | 1967-05-20 | 1973-01-09 | Telefunken Patent | A semiconductor device having a screen electrode of intrinsic semiconductor material |
GB1204805A (en) * | 1967-07-07 | 1970-09-09 | Hitachi Ltd | Semiconductor device |
GB1249812A (en) * | 1969-05-29 | 1971-10-13 | Ferranti Ltd | Improvements relating to semiconductor devices |
GB1282740A (en) * | 1969-10-21 | 1972-07-26 | Northrop Corp | Radiation resistant semiconductor device |
US3614546A (en) * | 1970-01-07 | 1971-10-19 | Rca Corp | Shielded semiconductor device |
US3715638A (en) * | 1971-05-10 | 1973-02-06 | Bendix Corp | Temperature compensator for capacitive pressure transducers |
US3946428A (en) * | 1973-09-19 | 1976-03-23 | Nippon Electric Company, Limited | Encapsulation package for a semiconductor element |
JPS51111069A (en) * | 1975-03-26 | 1976-10-01 | Hitachi Ltd | Semiconductor device |
US4177480A (en) * | 1975-10-02 | 1979-12-04 | Licentia Patent-Verwaltungs-G.M.B.H. | Integrated circuit arrangement with means for avoiding undesirable capacitive coupling between leads |
DE2543968A1 (de) * | 1975-10-02 | 1977-04-07 | Licentia Gmbh | Integrierte schaltungsanordnung |
DE2609077A1 (de) * | 1976-03-05 | 1977-09-15 | Bosch Gmbh Robert | Schaltanordnung mit einem streufeldkondensator |
JPS52120768A (en) * | 1976-04-05 | 1977-10-11 | Nec Corp | Semiconductor device |
JPS5591145A (en) * | 1978-12-28 | 1980-07-10 | Narumi China Corp | Production of ceramic package |
-
1979
- 1979-06-08 JP JP7190079A patent/JPS55163850A/ja active Granted
-
1980
- 1980-06-03 EP EP80301853A patent/EP0021643B1/en not_active Expired
- 1980-06-03 DE DE8080301853T patent/DE3070853D1/de not_active Expired
-
1983
- 1983-03-02 US US06/469,833 patent/US4580157A/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5588356A (en) * | 1978-12-27 | 1980-07-04 | Hitachi Ltd | Semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS55163850A (en) | 1980-12-20 |
EP0021643B1 (en) | 1985-07-10 |
DE3070853D1 (en) | 1985-08-14 |
EP0021643A1 (en) | 1981-01-07 |
US4580157A (en) | 1986-04-01 |
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