JPS6147634A - パタ−ンの欠陥検査方法 - Google Patents

パタ−ンの欠陥検査方法

Info

Publication number
JPS6147634A
JPS6147634A JP59168753A JP16875384A JPS6147634A JP S6147634 A JPS6147634 A JP S6147634A JP 59168753 A JP59168753 A JP 59168753A JP 16875384 A JP16875384 A JP 16875384A JP S6147634 A JPS6147634 A JP S6147634A
Authority
JP
Japan
Prior art keywords
pattern
width
directions
pixels
rule
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59168753A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0428139B2 (enrdf_load_stackoverflow
Inventor
Yasushi Uchiyama
内山　康
Daikichi Awamura
粟村　大吉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON JIDO SEIGYO KK
Original Assignee
NIPPON JIDO SEIGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON JIDO SEIGYO KK filed Critical NIPPON JIDO SEIGYO KK
Priority to JP59168753A priority Critical patent/JPS6147634A/ja
Publication of JPS6147634A publication Critical patent/JPS6147634A/ja
Publication of JPH0428139B2 publication Critical patent/JPH0428139B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP59168753A 1984-08-14 1984-08-14 パタ−ンの欠陥検査方法 Granted JPS6147634A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59168753A JPS6147634A (ja) 1984-08-14 1984-08-14 パタ−ンの欠陥検査方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59168753A JPS6147634A (ja) 1984-08-14 1984-08-14 パタ−ンの欠陥検査方法

Publications (2)

Publication Number Publication Date
JPS6147634A true JPS6147634A (ja) 1986-03-08
JPH0428139B2 JPH0428139B2 (enrdf_load_stackoverflow) 1992-05-13

Family

ID=15873789

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59168753A Granted JPS6147634A (ja) 1984-08-14 1984-08-14 パタ−ンの欠陥検査方法

Country Status (1)

Country Link
JP (1) JPS6147634A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0428139B2 (enrdf_load_stackoverflow) 1992-05-13

Similar Documents

Publication Publication Date Title
US5694214A (en) Surface inspection method and apparatus
US6968080B2 (en) Method and apparatus for generating part programs for use in image-measuring instruments, and image-measuring instrument and method of displaying measured results therefrom
JP3311135B2 (ja) 検査範囲認識方法
JPH10173029A (ja) ウェハの測定位置決定方法
US6256066B1 (en) High-resolution image pickup method and apparatus therefor
JPS61217704A (ja) 線幅測定装置
JPS643050B2 (enrdf_load_stackoverflow)
JP3721983B2 (ja) 三次元形状の欠陥検査方法
JPH1163922A (ja) 画像測定機及びその方法
US4851903A (en) Automatic focusing system of an observing means for inspecting an object
JPS60126830A (ja) パタ−ンの欠陥検査装置に用いる走査方法
US6680781B2 (en) Critical dimension measurement method and apparatus capable of measurement below the resolution of an optical microscope
JPS6147634A (ja) パタ−ンの欠陥検査方法
JP2000018919A (ja) 撮像装置，光学式測定装置および光学式検査装置
JP3036444B2 (ja) 収束電子線回折図形を用いた格子歪み評価方法および評価装置
JPS6243505A (ja) 半導体ウエハ上の被検査パターンの欠陥検査方法およびその装置
JP2009192371A (ja) 外観検査装置及び外観検査方法
JPH10311705A (ja) 画像入力装置
KR100543468B1 (ko) 반도체 패턴의 거리 측정 시스템 및 거리 측정 방법
JPH0666558A (ja) 微細対象物測定装置の測定箇所視野内設定方法
JP2829211B2 (ja) 合せずれ測定方法
JPH058822B2 (enrdf_load_stackoverflow)
JPH0518372B2 (enrdf_load_stackoverflow)
JPS6356702B2 (enrdf_load_stackoverflow)
JPS63199416A (ja) 位置ずれ測定用マ−クおよびこれを用いた位置ずれ測定方法

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees