JPS6145823B2 - - Google Patents

Info

Publication number
JPS6145823B2
JPS6145823B2 JP13627179A JP13627179A JPS6145823B2 JP S6145823 B2 JPS6145823 B2 JP S6145823B2 JP 13627179 A JP13627179 A JP 13627179A JP 13627179 A JP13627179 A JP 13627179A JP S6145823 B2 JPS6145823 B2 JP S6145823B2
Authority
JP
Japan
Prior art keywords
pattern
glass substrate
mask material
mask
resist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13627179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5660435A (en
Inventor
Makoto Nakase
Akizo Hideyama
Akira Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO ERU ESU AI GIJUTSU KENKYU KUMIAI filed Critical CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority to JP13627179A priority Critical patent/JPS5660435A/ja
Publication of JPS5660435A publication Critical patent/JPS5660435A/ja
Publication of JPS6145823B2 publication Critical patent/JPS6145823B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G03F1/78—Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam patterning of masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP13627179A 1979-10-22 1979-10-22 Mask pattern forming method Granted JPS5660435A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13627179A JPS5660435A (en) 1979-10-22 1979-10-22 Mask pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13627179A JPS5660435A (en) 1979-10-22 1979-10-22 Mask pattern forming method

Publications (2)

Publication Number Publication Date
JPS5660435A JPS5660435A (en) 1981-05-25
JPS6145823B2 true JPS6145823B2 (cg-RX-API-DMAC7.html) 1986-10-09

Family

ID=15171283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13627179A Granted JPS5660435A (en) 1979-10-22 1979-10-22 Mask pattern forming method

Country Status (1)

Country Link
JP (1) JPS5660435A (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0331320U (cg-RX-API-DMAC7.html) * 1989-08-03 1991-03-27

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0331320U (cg-RX-API-DMAC7.html) * 1989-08-03 1991-03-27

Also Published As

Publication number Publication date
JPS5660435A (en) 1981-05-25

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