JPS6141150A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS6141150A
JPS6141150A JP16314484A JP16314484A JPS6141150A JP S6141150 A JPS6141150 A JP S6141150A JP 16314484 A JP16314484 A JP 16314484A JP 16314484 A JP16314484 A JP 16314484A JP S6141150 A JPS6141150 A JP S6141150A
Authority
JP
Japan
Prior art keywords
light
reticle
lens system
grating
spatial filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16314484A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0443409B2 (enExample
Inventor
Noboru Nomura
登 野村
Makoto Kato
誠 加藤
Ryukichi Matsumura
松村　隆吉
Midori Yamaguchi
緑 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP16314484A priority Critical patent/JPS6141150A/ja
Publication of JPS6141150A publication Critical patent/JPS6141150A/ja
Publication of JPH0443409B2 publication Critical patent/JPH0443409B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP16314484A 1984-08-02 1984-08-02 露光装置 Granted JPS6141150A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16314484A JPS6141150A (ja) 1984-08-02 1984-08-02 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16314484A JPS6141150A (ja) 1984-08-02 1984-08-02 露光装置

Publications (2)

Publication Number Publication Date
JPS6141150A true JPS6141150A (ja) 1986-02-27
JPH0443409B2 JPH0443409B2 (enExample) 1992-07-16

Family

ID=15768050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16314484A Granted JPS6141150A (ja) 1984-08-02 1984-08-02 露光装置

Country Status (1)

Country Link
JP (1) JPS6141150A (enExample)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0327516A (ja) * 1988-07-26 1991-02-05 American Teleph & Telegr Co <Att> リソグラフィシステムとリソグラフィシステムの解像度向上方法
JPH04125841U (ja) * 1991-05-07 1992-11-17 象印マホービン株式会社 液体容器のハンドル取付け構造
US5316896A (en) * 1990-10-24 1994-05-31 Hitachi, Ltd. Method of forming a pattern
BE1007364A3 (fr) * 1992-09-03 1995-05-30 Samsung Electronics Co Ltd Procede, systeme et masque de projection.
US5420417A (en) * 1991-10-08 1995-05-30 Nikon Corporation Projection exposure apparatus with light distribution adjustment
US5574492A (en) * 1992-03-27 1996-11-12 Canon Kabushiki Kaisha Imaging method and semiconductor device manufacturing method using the same
US5638211A (en) * 1990-08-21 1997-06-10 Nikon Corporation Method and apparatus for increasing the resolution power of projection lithography exposure system
US5673102A (en) * 1991-02-22 1997-09-30 Canon Kabushiki Kaisha Image farming and microdevice manufacturing method and exposure apparatus in which a light source includes four quadrants of predetermined intensity
US6211944B1 (en) * 1990-08-21 2001-04-03 Nikon Corporation Projection exposure method and apparatus
US6233041B1 (en) 1990-08-21 2001-05-15 Nikon Corporation Exposure method utilizing diffracted light having different orders of diffraction
US6252647B1 (en) * 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US6710855B2 (en) 1990-11-15 2004-03-23 Nikon Corporation Projection exposure apparatus and method
US6710854B2 (en) 1991-09-11 2004-03-23 Nikon Corporation Projection exposure apparatus
CN111492304A (zh) * 2017-12-26 2020-08-04 三菱电机株式会社 光图案生成装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5645123A (en) * 1979-09-11 1981-04-24 Deere & Co Header of harvester
JPS57178212A (en) * 1981-04-27 1982-11-02 Nippon Kogaku Kk <Nikon> Microscope optical system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5645123A (en) * 1979-09-11 1981-04-24 Deere & Co Header of harvester
JPS57178212A (en) * 1981-04-27 1982-11-02 Nippon Kogaku Kk <Nikon> Microscope optical system

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0327516A (ja) * 1988-07-26 1991-02-05 American Teleph & Telegr Co <Att> リソグラフィシステムとリソグラフィシステムの解像度向上方法
US6211944B1 (en) * 1990-08-21 2001-04-03 Nikon Corporation Projection exposure method and apparatus
US7656504B1 (en) 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US6636293B1 (en) 1990-08-21 2003-10-21 Nikon Corporation Exposure method and apparatus having a decreased light intensity distribution
US6233041B1 (en) 1990-08-21 2001-05-15 Nikon Corporation Exposure method utilizing diffracted light having different orders of diffraction
US5638211A (en) * 1990-08-21 1997-06-10 Nikon Corporation Method and apparatus for increasing the resolution power of projection lithography exposure system
US5316896A (en) * 1990-10-24 1994-05-31 Hitachi, Ltd. Method of forming a pattern
US5418598A (en) * 1990-10-24 1995-05-23 Hitachi, Ltd. Projection exposure apparatus
US5595857A (en) * 1990-10-24 1997-01-21 Hitachi, Ltd. Method of forming a pattern and projection exposure apparatus
EP0777147A1 (en) * 1990-10-24 1997-06-04 Hitachi, Ltd. Method of forming a pattern and projecting exposure apparatus
US6710855B2 (en) 1990-11-15 2004-03-23 Nikon Corporation Projection exposure apparatus and method
US6704092B2 (en) 1990-11-15 2004-03-09 Nikon Corporation Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil plane
US6665050B2 (en) 1990-11-15 2003-12-16 Nikon Corporation Projection exposure methods using difracted light with increased intensity portions spaced from the optical axis
US6252647B1 (en) * 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US5673102A (en) * 1991-02-22 1997-09-30 Canon Kabushiki Kaisha Image farming and microdevice manufacturing method and exposure apparatus in which a light source includes four quadrants of predetermined intensity
US6084655A (en) * 1991-02-22 2000-07-04 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices
JPH04125841U (ja) * 1991-05-07 1992-11-17 象印マホービン株式会社 液体容器のハンドル取付け構造
US6710854B2 (en) 1991-09-11 2004-03-23 Nikon Corporation Projection exposure apparatus
US6864959B2 (en) 1991-09-11 2005-03-08 Nikon Corporation Projection exposure apparatus
US5420417A (en) * 1991-10-08 1995-05-30 Nikon Corporation Projection exposure apparatus with light distribution adjustment
US5574492A (en) * 1992-03-27 1996-11-12 Canon Kabushiki Kaisha Imaging method and semiconductor device manufacturing method using the same
BE1007364A3 (fr) * 1992-09-03 1995-05-30 Samsung Electronics Co Ltd Procede, systeme et masque de projection.
CN111492304A (zh) * 2017-12-26 2020-08-04 三菱电机株式会社 光图案生成装置
CN111492304B (zh) * 2017-12-26 2022-02-25 三菱电机株式会社 光图案生成装置

Also Published As

Publication number Publication date
JPH0443409B2 (enExample) 1992-07-16

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