JPS6141148A - 製版用感光性樹脂版材 - Google Patents

製版用感光性樹脂版材

Info

Publication number
JPS6141148A
JPS6141148A JP16268384A JP16268384A JPS6141148A JP S6141148 A JPS6141148 A JP S6141148A JP 16268384 A JP16268384 A JP 16268384A JP 16268384 A JP16268384 A JP 16268384A JP S6141148 A JPS6141148 A JP S6141148A
Authority
JP
Japan
Prior art keywords
resin
photosensitive resin
water
wall
vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16268384A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0568691B2 (enrdf_load_stackoverflow
Inventor
Kunio Maeda
前田 邦夫
Hiroyasu Miyasaka
宮坂 宏保
Satoru Nagao
長尾 悟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nichiban Co Ltd
Original Assignee
Nichiban Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nichiban Co Ltd filed Critical Nichiban Co Ltd
Priority to JP16268384A priority Critical patent/JPS6141148A/ja
Publication of JPS6141148A publication Critical patent/JPS6141148A/ja
Publication of JPH0568691B2 publication Critical patent/JPH0568691B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP16268384A 1984-07-31 1984-07-31 製版用感光性樹脂版材 Granted JPS6141148A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16268384A JPS6141148A (ja) 1984-07-31 1984-07-31 製版用感光性樹脂版材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16268384A JPS6141148A (ja) 1984-07-31 1984-07-31 製版用感光性樹脂版材

Publications (2)

Publication Number Publication Date
JPS6141148A true JPS6141148A (ja) 1986-02-27
JPH0568691B2 JPH0568691B2 (enrdf_load_stackoverflow) 1993-09-29

Family

ID=15759308

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16268384A Granted JPS6141148A (ja) 1984-07-31 1984-07-31 製版用感光性樹脂版材

Country Status (1)

Country Link
JP (1) JPS6141148A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0607106A1 (en) * 1993-01-12 1994-07-20 Riccardo De Caria Manufacturing process of improved photosensitive printing plates
FR2736866A1 (fr) * 1995-01-23 1997-01-24 Moureau Marie Lucienne Boite plate renfermant une resine liquide photopolymerisable destinee a la fabrication de tampons marqueurs ou a la fabrication de cliches durs pour prise d'empreinte
FR2736865A1 (fr) * 1995-01-23 1997-01-24 Moureau Marie Lucienne Boite plate renfermant une resine liquide photopolymerisable destinee a la fabrication de tampons marqueurs ou a la fabrication de cliches durs pour prise d'empreinte
FR2790713A1 (fr) * 1998-11-24 2000-09-15 Jean Luc Moureau Boite plate renfermant une resine liquide photopolymerisable destinee a la fabrication de tampons marqueurs ou a la fabrication de cliches durs pour prise d'empreintes
EP0932082A3 (en) * 1998-01-27 2000-11-29 International Business Machines Corporation Chemically amplified resist composition and method of creating a patterned resist using electron beam
US6737219B2 (en) 2001-08-10 2004-05-18 Paul Mayo Holt Photopolymer sachet
WO2006079788A3 (en) * 2005-01-25 2007-01-11 Photocentric Ltd Method of making a photopolymer plate
EP2151716A1 (de) 2008-08-07 2010-02-10 Trodat GmbH Element, insbesondere Photopolymer-Einheit

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5170001A (ja) * 1974-12-12 1976-06-17 Masahiko Ando Sukuriinpurosesushikishashinyokankoban
JPS53119025A (en) * 1977-03-26 1978-10-18 Sumitomo Chemical Co Light forming material
JPS54114305A (en) * 1978-02-23 1979-09-06 Sumitomo Chemical Co Lighttformed material

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5170001A (ja) * 1974-12-12 1976-06-17 Masahiko Ando Sukuriinpurosesushikishashinyokankoban
JPS53119025A (en) * 1977-03-26 1978-10-18 Sumitomo Chemical Co Light forming material
JPS54114305A (en) * 1978-02-23 1979-09-06 Sumitomo Chemical Co Lighttformed material

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0607106A1 (en) * 1993-01-12 1994-07-20 Riccardo De Caria Manufacturing process of improved photosensitive printing plates
FR2736866A1 (fr) * 1995-01-23 1997-01-24 Moureau Marie Lucienne Boite plate renfermant une resine liquide photopolymerisable destinee a la fabrication de tampons marqueurs ou a la fabrication de cliches durs pour prise d'empreinte
FR2736865A1 (fr) * 1995-01-23 1997-01-24 Moureau Marie Lucienne Boite plate renfermant une resine liquide photopolymerisable destinee a la fabrication de tampons marqueurs ou a la fabrication de cliches durs pour prise d'empreinte
EP0932082A3 (en) * 1998-01-27 2000-11-29 International Business Machines Corporation Chemically amplified resist composition and method of creating a patterned resist using electron beam
FR2790713A1 (fr) * 1998-11-24 2000-09-15 Jean Luc Moureau Boite plate renfermant une resine liquide photopolymerisable destinee a la fabrication de tampons marqueurs ou a la fabrication de cliches durs pour prise d'empreintes
US6737219B2 (en) 2001-08-10 2004-05-18 Paul Mayo Holt Photopolymer sachet
WO2006079788A3 (en) * 2005-01-25 2007-01-11 Photocentric Ltd Method of making a photopolymer plate
EP2151716A1 (de) 2008-08-07 2010-02-10 Trodat GmbH Element, insbesondere Photopolymer-Einheit
AT507137B1 (de) * 2008-08-07 2012-01-15 Trodat Gmbh Element, insbesondere photopolymer-einheit

Also Published As

Publication number Publication date
JPH0568691B2 (enrdf_load_stackoverflow) 1993-09-29

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