JPS6141093Y2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a mask dry plate holding device for holding a mask dry plate to be exposed when a resist is applied onto the exposed mask dry plate prior to electron beam exposure.

A mask dry plate is usually a glass plate with a film of chromium or chromium salt formed on it, and when forming extremely fine patterns on this mask dry plate, the mask dry plate is covered with a resist film and exposed to electron beams. A method has been adopted to do this. Incidentally, during electron beam exposure, it is necessary to completely ground the mask dry plate to prevent charging. However, if the above-mentioned resist film is applied using the normal spin coating method, the entire surface of the mask dry plate will be coated with resist. It is covered with a membrane, making it impossible to secure a ground surface.

For this reason, in the past, a resist film with a uniform thickness was formed on the entire surface of a mask dry plate using the usual spin coating method, and then specific areas of the resist film were physically or chemically removed to form a contact surface. It was done to ensure that. According to this method, although a grounding surface is reliably secured, there is a risk that the effective resist coated surface may be contaminated during the resist film removal process, resulting in the inconvenience of lowering the writing accuracy and also causing the problem of dust. It is also a source of

The present invention was devised in view of the above-mentioned disadvantages, and provides a holding device that can leave uncoated portions of the resist film in specific areas of the mask dry plate when using a normal spin coating device. be.
The mask dry plate holding device of the present invention will be described in detail below with reference to the drawings.

FIG. 1 is a top view showing a mask dry plate held by the mask dry plate holding device of the present invention;
The figure is a sectional view taken along the line X--X of FIG. 1, and FIG. 3 is a bottom view. In the figure, reference numeral 1 denotes a holding frame made of metal or synthetic resin, and the area of the upper open end 2 is smaller than the area of the mask dry plate 3 shown by the dotted line, while the area of the lower opening 4 is smaller than the area of the mask dry plate 3. The area of the mask dry plate 3 is selected to be slightly larger than the area of the dry plate 3, and the mask dry plate 3 is fitted into the recess of the holding frame 1 from below using the lower opening as a guide. Furthermore, the four sides of the upper surface of the holding frame have notches 51, 52, 5 for scattering unnecessary resist during spin coating.
3, 54 are formed, 4 intervals 61, 62, 63, 6
4 is the thick part. Further, on the lower surface side of the holding frame 1, as shown in FIG.
2, 73, 74 are attached, but these are prismatic stopper supports 81, 82, 83,
84 and cylindrical stopper supports 91,9
A portion thereof is fitted into the gap formed between the notch formed in each of 9, 93, and 94 and the lower surface of the holding frame.

Note that each of the plate-shaped stoppers 71 to 74 may be unwarped, but if the plate-shaped stopper is formed of an elastic metal plate with a warp, for example, the elastic force The mask dry plate 3 can be pressed from below to above,
Therefore, the mask dry plate can be tightly fixed to the holding frame 1 more reliably.

After holding the mask plate in the state shown in the figure with the mask plate holding device configured as described above,
This is mounted on a well-known rotary coating device, and a resist is applied to the surface of the mask dry plate exposed inside the upper opening 2 of the holding frame 1. As described above, unnecessary resist is surely scattered from the notches 51 to 54 of the holding frame, and a resist film of uniform thickness is formed on the exposed surface of the mask dry plate, and the resist is removed by the holding frame 1. A resist-unapplied portion is formed in the covered portion.

FIG. 4 is a perspective view showing a mask dry plate on which a resist film is formed using the mask dry plate holding device of the present invention, and as shown in the figure, the shape of the upper opening 2 is the same as that shown in FIG. Resist film 1 with shape
0, a mask dry plate 3 having no resist film 10 and an uncoated portion 11 which becomes a ground plane during electron beam exposure is obtained.

As is clear from the above explanation, according to the mask dry plate holding device of the present invention, resist coated areas and uncoated areas can be simultaneously formed on the mask dry plate during the resist coating process, unlike conventional methods. In addition, it is not necessary to remove a part of the resist film after forming the resist film to obtain a ground plane, and therefore, the ground plane can be obtained without contaminating the effective resist film, and high drawing accuracy can be obtained. can. Furthermore, since there is no source of dust, the working environment can be cleaned, which greatly contributes to the production of high-density semiconductor devices.

[Brief explanation of the drawing]

Figures 1, 2, and 3 are a top view, an X-X cross-sectional view, and a bottom view showing the structure of the mask plate holding device of the present invention and the state in which the device holds a mask plate; FIG. 2 is a perspective view showing a mask dry plate on which a resist film is formed. DESCRIPTION OF SYMBOLS 1...Holding frame, 2...Upper opening, 3...Mask dry plate, 4...Lower opening, 51-54...Notch, 71-74...Plate stopper, 81-84...
...Prismatic stopper support, 91-94...Cylindrical stopper support, 10...Resist film, 11
...Uncoated area (ground surface).

Claims (1)

[Scope of utility model registration request] A holding frame that forms a mask dry plate storage section with an upper open end that is selected to be smaller than the shape of the mask dry plate and a lower open end that is slightly larger than the shape of the mask dry plate, and a resist scattering formed on the upper surface side of the holding frame. a stopper support attached to the lower surface side of the holding frame, and a stopper for preventing detachment of the mask dry plate that is supported by the stopper support and inserted into the mask dry plate storage section. holding device.