JPS6140755B2 - - Google Patents
Info
- Publication number
- JPS6140755B2 JPS6140755B2 JP3822279A JP3822279A JPS6140755B2 JP S6140755 B2 JPS6140755 B2 JP S6140755B2 JP 3822279 A JP3822279 A JP 3822279A JP 3822279 A JP3822279 A JP 3822279A JP S6140755 B2 JPS6140755 B2 JP S6140755B2
- Authority
- JP
- Japan
- Prior art keywords
- zinc
- selenium
- selenide
- vapor
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 32
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 claims description 25
- 239000011701 zinc Substances 0.000 claims description 25
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 23
- 239000011669 selenium Substances 0.000 claims description 23
- 229910052725 zinc Inorganic materials 0.000 claims description 23
- 229910052711 selenium Inorganic materials 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 20
- 229910052786 argon Inorganic materials 0.000 description 10
- 239000012159 carrier gas Substances 0.000 description 10
- 239000007789 gas Substances 0.000 description 10
- 229910000058 selane Inorganic materials 0.000 description 10
- 239000002994 raw material Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 229910002804 graphite Inorganic materials 0.000 description 5
- 239000010439 graphite Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- XYUNNDAEUQFHGV-UHFFFAOYSA-N [Se].[Se] Chemical compound [Se].[Se] XYUNNDAEUQFHGV-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3822279A JPS55130805A (en) | 1979-03-30 | 1979-03-30 | Manufacture of zinc selenide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3822279A JPS55130805A (en) | 1979-03-30 | 1979-03-30 | Manufacture of zinc selenide |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55130805A JPS55130805A (en) | 1980-10-11 |
| JPS6140755B2 true JPS6140755B2 (enrdf_load_stackoverflow) | 1986-09-10 |
Family
ID=12519267
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3822279A Granted JPS55130805A (en) | 1979-03-30 | 1979-03-30 | Manufacture of zinc selenide |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55130805A (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4978577A (en) * | 1989-04-12 | 1990-12-18 | Cvd Incorporated | Method for preparing laminates of ZnSe and ZnS |
| CN101118111B (zh) | 2007-08-31 | 2010-05-19 | 侯仁义 | 多层化合物合成炉装置 |
| US8507040B2 (en) | 2008-05-08 | 2013-08-13 | Air Products And Chemicals, Inc. | Binary and ternary metal chalcogenide materials and method of making and using same |
| US8765223B2 (en) * | 2008-05-08 | 2014-07-01 | Air Products And Chemicals, Inc. | Binary and ternary metal chalcogenide materials and method of making and using same |
-
1979
- 1979-03-30 JP JP3822279A patent/JPS55130805A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55130805A (en) | 1980-10-11 |
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