JPS6139041A - ポジ型レジスト現像液 - Google Patents

ポジ型レジスト現像液

Info

Publication number
JPS6139041A
JPS6139041A JP59159345A JP15934584A JPS6139041A JP S6139041 A JPS6139041 A JP S6139041A JP 59159345 A JP59159345 A JP 59159345A JP 15934584 A JP15934584 A JP 15934584A JP S6139041 A JPS6139041 A JP S6139041A
Authority
JP
Japan
Prior art keywords
weight
developer
parts
positive
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59159345A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0451019B2 (cg-RX-API-DMAC7.html
Inventor
Hiroshi Komano
博司 駒野
Toshimi Aoyama
青山　俊身
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP59159345A priority Critical patent/JPS6139041A/ja
Publication of JPS6139041A publication Critical patent/JPS6139041A/ja
Publication of JPH0451019B2 publication Critical patent/JPH0451019B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59159345A 1984-07-31 1984-07-31 ポジ型レジスト現像液 Granted JPS6139041A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59159345A JPS6139041A (ja) 1984-07-31 1984-07-31 ポジ型レジスト現像液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59159345A JPS6139041A (ja) 1984-07-31 1984-07-31 ポジ型レジスト現像液

Publications (2)

Publication Number Publication Date
JPS6139041A true JPS6139041A (ja) 1986-02-25
JPH0451019B2 JPH0451019B2 (cg-RX-API-DMAC7.html) 1992-08-17

Family

ID=15691810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59159345A Granted JPS6139041A (ja) 1984-07-31 1984-07-31 ポジ型レジスト現像液

Country Status (1)

Country Link
JP (1) JPS6139041A (cg-RX-API-DMAC7.html)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6462359A (en) * 1987-09-02 1989-03-08 Japan Synthetic Rubber Co Ltd Radiation-sensitive composition
US5094934A (en) * 1987-04-06 1992-03-10 Morton International, Inc. Method of developing a high contrast, positive photoresist using a developer containing alkanolamine
US5126230A (en) * 1987-04-06 1992-06-30 Morton International, Inc. High contrast, positive photoresist developer containing alkanolamine
JPH0862852A (ja) * 1995-01-30 1996-03-08 Hitachi Plant Eng & Constr Co Ltd 現像原液の希釈装置
US7638246B2 (en) 2004-06-30 2009-12-29 Lg Display Co., Ltd. Photo development apparatus and method for fabricating a color filter substrate using the same
JP2020144355A (ja) * 2019-02-28 2020-09-10 東京応化工業株式会社 感光性樹脂組成物、及びガラス基板のエッチング方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5688135A (en) * 1979-12-21 1981-07-17 Hitachi Ltd Developer

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5688135A (en) * 1979-12-21 1981-07-17 Hitachi Ltd Developer

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5094934A (en) * 1987-04-06 1992-03-10 Morton International, Inc. Method of developing a high contrast, positive photoresist using a developer containing alkanolamine
US5126230A (en) * 1987-04-06 1992-06-30 Morton International, Inc. High contrast, positive photoresist developer containing alkanolamine
JPS6462359A (en) * 1987-09-02 1989-03-08 Japan Synthetic Rubber Co Ltd Radiation-sensitive composition
JPH0862852A (ja) * 1995-01-30 1996-03-08 Hitachi Plant Eng & Constr Co Ltd 現像原液の希釈装置
US7638246B2 (en) 2004-06-30 2009-12-29 Lg Display Co., Ltd. Photo development apparatus and method for fabricating a color filter substrate using the same
US7874748B2 (en) 2004-06-30 2011-01-25 Lg Display Co., Ltd. Photo development apparatus and method for fabricating a color filter substrate using the same
JP2020144355A (ja) * 2019-02-28 2020-09-10 東京応化工業株式会社 感光性樹脂組成物、及びガラス基板のエッチング方法

Also Published As

Publication number Publication date
JPH0451019B2 (cg-RX-API-DMAC7.html) 1992-08-17

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term