JPS6137775B2 - - Google Patents
Info
- Publication number
- JPS6137775B2 JPS6137775B2 JP16171380A JP16171380A JPS6137775B2 JP S6137775 B2 JPS6137775 B2 JP S6137775B2 JP 16171380 A JP16171380 A JP 16171380A JP 16171380 A JP16171380 A JP 16171380A JP S6137775 B2 JPS6137775 B2 JP S6137775B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- protective resin
- film
- resin film
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16171380A JPS5785230A (en) | 1980-11-17 | 1980-11-17 | Substrate treatment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16171380A JPS5785230A (en) | 1980-11-17 | 1980-11-17 | Substrate treatment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5785230A JPS5785230A (en) | 1982-05-27 |
| JPS6137775B2 true JPS6137775B2 (cs) | 1986-08-26 |
Family
ID=15740456
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16171380A Granted JPS5785230A (en) | 1980-11-17 | 1980-11-17 | Substrate treatment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5785230A (cs) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06100825B2 (ja) * | 1985-08-29 | 1994-12-12 | 富士通株式会社 | パタ−ン形成方法 |
| JP7602924B2 (ja) * | 2021-02-02 | 2024-12-19 | 東京エレクトロン株式会社 | 基板処理装置、基板処理システム、基板処理方法及びコンピュータ記憶媒体 |
-
1980
- 1980-11-17 JP JP16171380A patent/JPS5785230A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5785230A (en) | 1982-05-27 |
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