JPS5785230A - Substrate treatment - Google Patents
Substrate treatmentInfo
- Publication number
- JPS5785230A JPS5785230A JP16171380A JP16171380A JPS5785230A JP S5785230 A JPS5785230 A JP S5785230A JP 16171380 A JP16171380 A JP 16171380A JP 16171380 A JP16171380 A JP 16171380A JP S5785230 A JPS5785230 A JP S5785230A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- film
- protective resin
- resin film
- photoresisting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title abstract 8
- 230000001681 protective effect Effects 0.000 abstract 5
- 239000011347 resin Substances 0.000 abstract 5
- 229920005989 resin Polymers 0.000 abstract 5
- 238000004299 exfoliation Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To highten tightness of a substrate and make mechanical exfoliation possible by covering a substrate attached with a photoresisting film by a protective resin film and by exfoliating the protective resin film with gas generated by the photoreaction of the photoresisting film by ultraviolet rays. CONSTITUTION:When storing a substrate the required region of said substrate is attached by a photoresisting film to be covered with a protective resin film. Then, when using the substrate, said substrate is irradiated by ultraviolet rays to make the photoresisting film to cause the photoreaction and to form an air gap between the substrate and the protective resin film with gas produced by the photoreaction for exfoliating the protective resin film from said air gap.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16171380A JPS5785230A (en) | 1980-11-17 | 1980-11-17 | Substrate treatment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16171380A JPS5785230A (en) | 1980-11-17 | 1980-11-17 | Substrate treatment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5785230A true JPS5785230A (en) | 1982-05-27 |
JPS6137775B2 JPS6137775B2 (en) | 1986-08-26 |
Family
ID=15740456
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16171380A Granted JPS5785230A (en) | 1980-11-17 | 1980-11-17 | Substrate treatment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5785230A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6250758A (en) * | 1985-08-29 | 1987-03-05 | Fujitsu Ltd | Formation of pattern |
-
1980
- 1980-11-17 JP JP16171380A patent/JPS5785230A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6250758A (en) * | 1985-08-29 | 1987-03-05 | Fujitsu Ltd | Formation of pattern |
Also Published As
Publication number | Publication date |
---|---|
JPS6137775B2 (en) | 1986-08-26 |
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