JPS5785230A - Substrate treatment - Google Patents

Substrate treatment

Info

Publication number
JPS5785230A
JPS5785230A JP16171380A JP16171380A JPS5785230A JP S5785230 A JPS5785230 A JP S5785230A JP 16171380 A JP16171380 A JP 16171380A JP 16171380 A JP16171380 A JP 16171380A JP S5785230 A JPS5785230 A JP S5785230A
Authority
JP
Japan
Prior art keywords
substrate
film
protective resin
resin film
photoresisting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16171380A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6137775B2 (cs
Inventor
Eiji Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16171380A priority Critical patent/JPS5785230A/ja
Publication of JPS5785230A publication Critical patent/JPS5785230A/ja
Publication of JPS6137775B2 publication Critical patent/JPS6137775B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP16171380A 1980-11-17 1980-11-17 Substrate treatment Granted JPS5785230A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16171380A JPS5785230A (en) 1980-11-17 1980-11-17 Substrate treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16171380A JPS5785230A (en) 1980-11-17 1980-11-17 Substrate treatment

Publications (2)

Publication Number Publication Date
JPS5785230A true JPS5785230A (en) 1982-05-27
JPS6137775B2 JPS6137775B2 (cs) 1986-08-26

Family

ID=15740456

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16171380A Granted JPS5785230A (en) 1980-11-17 1980-11-17 Substrate treatment

Country Status (1)

Country Link
JP (1) JPS5785230A (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6250758A (ja) * 1985-08-29 1987-03-05 Fujitsu Ltd パタ−ン形成方法
JP2022118376A (ja) * 2021-02-02 2022-08-15 東京エレクトロン株式会社 基板処理装置、基板処理システム、基板処理方法及びコンピュータ記憶媒体

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6250758A (ja) * 1985-08-29 1987-03-05 Fujitsu Ltd パタ−ン形成方法
JP2022118376A (ja) * 2021-02-02 2022-08-15 東京エレクトロン株式会社 基板処理装置、基板処理システム、基板処理方法及びコンピュータ記憶媒体

Also Published As

Publication number Publication date
JPS6137775B2 (cs) 1986-08-26

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