JPS6133256B2 - - Google Patents

Info

Publication number
JPS6133256B2
JPS6133256B2 JP54061078A JP6107879A JPS6133256B2 JP S6133256 B2 JPS6133256 B2 JP S6133256B2 JP 54061078 A JP54061078 A JP 54061078A JP 6107879 A JP6107879 A JP 6107879A JP S6133256 B2 JPS6133256 B2 JP S6133256B2
Authority
JP
Japan
Prior art keywords
quartz tube
silicon
gas
substrate
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54061078A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55151339A (en
Inventor
Masaaki Sadamori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6107879A priority Critical patent/JPS55151339A/ja
Publication of JPS55151339A publication Critical patent/JPS55151339A/ja
Publication of JPS6133256B2 publication Critical patent/JPS6133256B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Recrystallisation Techniques (AREA)
JP6107879A 1979-05-16 1979-05-16 Quartz tube for heat treatment Granted JPS55151339A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6107879A JPS55151339A (en) 1979-05-16 1979-05-16 Quartz tube for heat treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6107879A JPS55151339A (en) 1979-05-16 1979-05-16 Quartz tube for heat treatment

Publications (2)

Publication Number Publication Date
JPS55151339A JPS55151339A (en) 1980-11-25
JPS6133256B2 true JPS6133256B2 (enrdf_load_stackoverflow) 1986-08-01

Family

ID=13160726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6107879A Granted JPS55151339A (en) 1979-05-16 1979-05-16 Quartz tube for heat treatment

Country Status (1)

Country Link
JP (1) JPS55151339A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58170019A (ja) * 1982-03-31 1983-10-06 Fujitsu Ltd 半導体装置製造装置
US6042654A (en) * 1998-01-13 2000-03-28 Applied Materials, Inc. Method of cleaning CVD cold-wall chamber and exhaust lines
US6559421B1 (en) 1999-10-29 2003-05-06 Ricoh Company, Ltd. Image forming apparatus and fixing device therefor

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5029166A (enrdf_load_stackoverflow) * 1973-07-17 1975-03-25
JPS5150576A (ja) * 1974-10-29 1976-05-04 Tokyo Shibaura Electric Co Handotaikibanjonosankakeisosokisoseichoho

Also Published As

Publication number Publication date
JPS55151339A (en) 1980-11-25

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