JPS6132662B2 - - Google Patents

Info

Publication number
JPS6132662B2
JPS6132662B2 JP54018118A JP1811879A JPS6132662B2 JP S6132662 B2 JPS6132662 B2 JP S6132662B2 JP 54018118 A JP54018118 A JP 54018118A JP 1811879 A JP1811879 A JP 1811879A JP S6132662 B2 JPS6132662 B2 JP S6132662B2
Authority
JP
Japan
Prior art keywords
resist
sensitivity
substrate
exposure
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54018118A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55110240A (en
Inventor
Akira Morishige
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1811879A priority Critical patent/JPS55110240A/ja
Publication of JPS55110240A publication Critical patent/JPS55110240A/ja
Publication of JPS6132662B2 publication Critical patent/JPS6132662B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/685—Compositions containing spiro-condensed pyran compounds or derivatives thereof, as photosensitive substances

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP1811879A 1979-02-19 1979-02-19 Photoresist Granted JPS55110240A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1811879A JPS55110240A (en) 1979-02-19 1979-02-19 Photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1811879A JPS55110240A (en) 1979-02-19 1979-02-19 Photoresist

Publications (2)

Publication Number Publication Date
JPS55110240A JPS55110240A (en) 1980-08-25
JPS6132662B2 true JPS6132662B2 (enrdf_load_stackoverflow) 1986-07-28

Family

ID=11962682

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1811879A Granted JPS55110240A (en) 1979-02-19 1979-02-19 Photoresist

Country Status (1)

Country Link
JP (1) JPS55110240A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57112744A (en) * 1980-12-29 1982-07-13 Fujitsu Ltd Photoresist
DE3602215A1 (de) * 1986-01-25 1987-07-30 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
JPH09211849A (ja) * 1996-02-07 1997-08-15 Nec Corp レジスト材料およびパターン形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6022346B2 (ja) * 1976-12-23 1985-06-01 富士通株式会社 フオトマスクのパタ−ン修正方法

Also Published As

Publication number Publication date
JPS55110240A (en) 1980-08-25

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