JPS55110240A - Photoresist - Google Patents

Photoresist

Info

Publication number
JPS55110240A
JPS55110240A JP1811879A JP1811879A JPS55110240A JP S55110240 A JPS55110240 A JP S55110240A JP 1811879 A JP1811879 A JP 1811879A JP 1811879 A JP1811879 A JP 1811879A JP S55110240 A JPS55110240 A JP S55110240A
Authority
JP
Japan
Prior art keywords
derivative
dye
sensitivity
formula
group bonded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1811879A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6132662B2 (enrdf_load_stackoverflow
Inventor
Akira Morishige
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1811879A priority Critical patent/JPS55110240A/ja
Publication of JPS55110240A publication Critical patent/JPS55110240A/ja
Publication of JPS6132662B2 publication Critical patent/JPS6132662B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/685—Compositions containing spiro-condensed pyran compounds or derivatives thereof, as photosensitive substances

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP1811879A 1979-02-19 1979-02-19 Photoresist Granted JPS55110240A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1811879A JPS55110240A (en) 1979-02-19 1979-02-19 Photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1811879A JPS55110240A (en) 1979-02-19 1979-02-19 Photoresist

Publications (2)

Publication Number Publication Date
JPS55110240A true JPS55110240A (en) 1980-08-25
JPS6132662B2 JPS6132662B2 (enrdf_load_stackoverflow) 1986-07-28

Family

ID=11962682

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1811879A Granted JPS55110240A (en) 1979-02-19 1979-02-19 Photoresist

Country Status (1)

Country Link
JP (1) JPS55110240A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57112744A (en) * 1980-12-29 1982-07-13 Fujitsu Ltd Photoresist
JPS62184455A (ja) * 1986-01-25 1987-08-12 モートン　インターナショナル　インコーポレイテッド 光重合性組成物
JPH09211849A (ja) * 1996-02-07 1997-08-15 Nec Corp レジスト材料およびパターン形成方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5379528A (en) * 1976-12-23 1978-07-14 Fujitsu Ltd Pattern formation process

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5379528A (en) * 1976-12-23 1978-07-14 Fujitsu Ltd Pattern formation process

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57112744A (en) * 1980-12-29 1982-07-13 Fujitsu Ltd Photoresist
JPS62184455A (ja) * 1986-01-25 1987-08-12 モートン　インターナショナル　インコーポレイテッド 光重合性組成物
JPH09211849A (ja) * 1996-02-07 1997-08-15 Nec Corp レジスト材料およびパターン形成方法

Also Published As

Publication number Publication date
JPS6132662B2 (enrdf_load_stackoverflow) 1986-07-28

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