JPS61295633A - レジスト塗布装置 - Google Patents
レジスト塗布装置Info
- Publication number
- JPS61295633A JPS61295633A JP60139613A JP13961385A JPS61295633A JP S61295633 A JPS61295633 A JP S61295633A JP 60139613 A JP60139613 A JP 60139613A JP 13961385 A JP13961385 A JP 13961385A JP S61295633 A JPS61295633 A JP S61295633A
- Authority
- JP
- Japan
- Prior art keywords
- cup
- wafer
- exhaust port
- current
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60139613A JPS61295633A (ja) | 1985-06-24 | 1985-06-24 | レジスト塗布装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60139613A JPS61295633A (ja) | 1985-06-24 | 1985-06-24 | レジスト塗布装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61295633A true JPS61295633A (ja) | 1986-12-26 |
| JPH0322687B2 JPH0322687B2 (enExample) | 1991-03-27 |
Family
ID=15249367
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60139613A Granted JPS61295633A (ja) | 1985-06-24 | 1985-06-24 | レジスト塗布装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61295633A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015026792A (ja) * | 2013-07-29 | 2015-02-05 | 東京エレクトロン株式会社 | 塗布膜形成装置、塗布膜形成方法、記憶媒体 |
-
1985
- 1985-06-24 JP JP60139613A patent/JPS61295633A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015026792A (ja) * | 2013-07-29 | 2015-02-05 | 東京エレクトロン株式会社 | 塗布膜形成装置、塗布膜形成方法、記憶媒体 |
| KR20150014383A (ko) * | 2013-07-29 | 2015-02-06 | 도쿄엘렉트론가부시키가이샤 | 도포막 형성 장치, 도포막 형성 방법, 기억 매체 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0322687B2 (enExample) | 1991-03-27 |
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