JPS61291972A - マグネトロンスパツタ装置 - Google Patents
マグネトロンスパツタ装置Info
- Publication number
- JPS61291972A JPS61291972A JP13252685A JP13252685A JPS61291972A JP S61291972 A JPS61291972 A JP S61291972A JP 13252685 A JP13252685 A JP 13252685A JP 13252685 A JP13252685 A JP 13252685A JP S61291972 A JPS61291972 A JP S61291972A
- Authority
- JP
- Japan
- Prior art keywords
- magnet
- magnets
- magnetic field
- target
- magnetron sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13252685A JPS61291972A (ja) | 1985-06-18 | 1985-06-18 | マグネトロンスパツタ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13252685A JPS61291972A (ja) | 1985-06-18 | 1985-06-18 | マグネトロンスパツタ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61291972A true JPS61291972A (ja) | 1986-12-22 |
| JPH0243825B2 JPH0243825B2 (member.php) | 1990-10-01 |
Family
ID=15083357
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13252685A Granted JPS61291972A (ja) | 1985-06-18 | 1985-06-18 | マグネトロンスパツタ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61291972A (member.php) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001073134A (ja) * | 1999-07-06 | 2001-03-21 | Applied Materials Inc | スパッタリング装置および成膜方法 |
| JP2001077052A (ja) * | 1999-07-06 | 2001-03-23 | Applied Materials Inc | スパッタリング装置および成膜方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60116774A (ja) * | 1983-11-30 | 1985-06-24 | Nippon Texas Instr Kk | スパッタ装置 |
-
1985
- 1985-06-18 JP JP13252685A patent/JPS61291972A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60116774A (ja) * | 1983-11-30 | 1985-06-24 | Nippon Texas Instr Kk | スパッタ装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001073134A (ja) * | 1999-07-06 | 2001-03-21 | Applied Materials Inc | スパッタリング装置および成膜方法 |
| JP2001077052A (ja) * | 1999-07-06 | 2001-03-23 | Applied Materials Inc | スパッタリング装置および成膜方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0243825B2 (member.php) | 1990-10-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |