JPS61279852A - 感光性耐熱材料 - Google Patents

感光性耐熱材料

Info

Publication number
JPS61279852A
JPS61279852A JP12191885A JP12191885A JPS61279852A JP S61279852 A JPS61279852 A JP S61279852A JP 12191885 A JP12191885 A JP 12191885A JP 12191885 A JP12191885 A JP 12191885A JP S61279852 A JPS61279852 A JP S61279852A
Authority
JP
Japan
Prior art keywords
photosensitive
heat
resistant material
terminal
hpls
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12191885A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0456975B2 (en:Method
Inventor
Hiroshi Adachi
足達　廣士
Etsushi Adachi
悦志 足立
Osamu Hayashi
修 林
Kazuo Okabashi
岡橋　和郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP12191885A priority Critical patent/JPS61279852A/ja
Publication of JPS61279852A publication Critical patent/JPS61279852A/ja
Publication of JPH0456975B2 publication Critical patent/JPH0456975B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP12191885A 1985-06-05 1985-06-05 感光性耐熱材料 Granted JPS61279852A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12191885A JPS61279852A (ja) 1985-06-05 1985-06-05 感光性耐熱材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12191885A JPS61279852A (ja) 1985-06-05 1985-06-05 感光性耐熱材料

Publications (2)

Publication Number Publication Date
JPS61279852A true JPS61279852A (ja) 1986-12-10
JPH0456975B2 JPH0456975B2 (en:Method) 1992-09-10

Family

ID=14823132

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12191885A Granted JPS61279852A (ja) 1985-06-05 1985-06-05 感光性耐熱材料

Country Status (1)

Country Link
JP (1) JPS61279852A (en:Method)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0299955A (ja) * 1988-10-06 1990-04-11 Fujitsu Ltd 感光性耐熱樹脂組成物と半導体装置の製造方法
JPH10319597A (ja) * 1997-05-23 1998-12-04 Mitsubishi Electric Corp 感光性シリコーンラダー系樹脂組成物、この樹脂組成物にパターンを転写するパターン転写方法および上記樹脂組成物を用いた半導体装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5869217A (ja) * 1981-10-22 1983-04-25 Japan Synthetic Rubber Co Ltd 感光性シリコ−ン樹脂組成物
JPS5893240A (ja) * 1981-11-30 1983-06-02 Japan Synthetic Rubber Co Ltd 半導体装置及びその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5869217A (ja) * 1981-10-22 1983-04-25 Japan Synthetic Rubber Co Ltd 感光性シリコ−ン樹脂組成物
JPS5893240A (ja) * 1981-11-30 1983-06-02 Japan Synthetic Rubber Co Ltd 半導体装置及びその製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0299955A (ja) * 1988-10-06 1990-04-11 Fujitsu Ltd 感光性耐熱樹脂組成物と半導体装置の製造方法
JPH10319597A (ja) * 1997-05-23 1998-12-04 Mitsubishi Electric Corp 感光性シリコーンラダー系樹脂組成物、この樹脂組成物にパターンを転写するパターン転写方法および上記樹脂組成物を用いた半導体装置

Also Published As

Publication number Publication date
JPH0456975B2 (en:Method) 1992-09-10

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees