JPS6127929B2 - - Google Patents
Info
- Publication number
- JPS6127929B2 JPS6127929B2 JP12792577A JP12792577A JPS6127929B2 JP S6127929 B2 JPS6127929 B2 JP S6127929B2 JP 12792577 A JP12792577 A JP 12792577A JP 12792577 A JP12792577 A JP 12792577A JP S6127929 B2 JPS6127929 B2 JP S6127929B2
- Authority
- JP
- Japan
- Prior art keywords
- tuning fork
- crystal
- film
- crystal substrate
- metal film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 claims description 56
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 16
- 238000001259 photo etching Methods 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 229920002120 photoresistant polymer Polymers 0.000 claims description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 5
- 230000008569 process Effects 0.000 claims description 5
- 230000001681 protective effect Effects 0.000 claims description 5
- 238000005530 etching Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims 5
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims 1
- 238000004080 punching Methods 0.000 claims 1
- 238000001771 vacuum deposition Methods 0.000 claims 1
- 238000005516 engineering process Methods 0.000 description 11
- 238000000206 photolithography Methods 0.000 description 9
- 238000003672 processing method Methods 0.000 description 7
- 238000005452 bending Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 4
- 239000002775 capsule Substances 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- GNFTZDOKVXKIBK-UHFFFAOYSA-N 3-(2-methoxyethoxy)benzohydrazide Chemical compound COCCOC1=CC=CC(C(=O)NN)=C1 GNFTZDOKVXKIBK-UHFFFAOYSA-N 0.000 description 1
- FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12792577A JPS5460883A (en) | 1977-10-25 | 1977-10-25 | Manufacture of thin plate piezoelectric oscillator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12792577A JPS5460883A (en) | 1977-10-25 | 1977-10-25 | Manufacture of thin plate piezoelectric oscillator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5460883A JPS5460883A (en) | 1979-05-16 |
| JPS6127929B2 true JPS6127929B2 (en, 2012) | 1986-06-27 |
Family
ID=14972016
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12792577A Granted JPS5460883A (en) | 1977-10-25 | 1977-10-25 | Manufacture of thin plate piezoelectric oscillator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5460883A (en, 2012) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000005812A1 (fr) * | 1998-07-24 | 2000-02-03 | Seiko Epson Corporation | Oscillateur piezoelectrique et son procede de production |
| WO2020244396A1 (zh) * | 2019-06-06 | 2020-12-10 | 江苏和成显示科技有限公司 | 一种液晶组合物及液晶显示器件 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4096787B2 (ja) * | 2003-04-11 | 2008-06-04 | 株式会社村田製作所 | 弾性表面波素子の製造方法 |
| JP5155620B2 (ja) * | 2006-08-31 | 2013-03-06 | セイコーインスツル株式会社 | 厚み滑り振動片の製造方法 |
-
1977
- 1977-10-25 JP JP12792577A patent/JPS5460883A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000005812A1 (fr) * | 1998-07-24 | 2000-02-03 | Seiko Epson Corporation | Oscillateur piezoelectrique et son procede de production |
| US6961981B2 (en) | 1998-07-24 | 2005-11-08 | Seiko Epson Corporation | Method of producing a piezoelectric resonator |
| WO2020244396A1 (zh) * | 2019-06-06 | 2020-12-10 | 江苏和成显示科技有限公司 | 一种液晶组合物及液晶显示器件 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5460883A (en) | 1979-05-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4456850A (en) | Piezoelectric composite thin film resonator | |
| CN101123423B (zh) | At切割水晶振动片及其制造方法 | |
| EP0797300B1 (en) | Piezoelectric vibrator and manufacturing method thereof | |
| US3969641A (en) | Quartz crystal vibrator | |
| JPH0584684B2 (en, 2012) | ||
| JP4665282B2 (ja) | Ａｔカット水晶振動子 | |
| JP2973560B2 (ja) | 水晶振動子の加工方法 | |
| JPH01129517A (ja) | 表面波共振素子の製造方法 | |
| US4253036A (en) | Subminiature tuning fork quartz crystal vibrator with nicrome and palladium electrode layers | |
| WO1991019352A1 (en) | Ultra thin quartz crystal filter element of multiple mode | |
| JPS6068711A (ja) | 圧電薄膜共振子 | |
| JPH11340775A (ja) | 圧電振動子 | |
| JPS6127929B2 (en, 2012) | ||
| JPS62266906A (ja) | 圧電薄膜共振子 | |
| JP4196641B2 (ja) | 超薄板圧電デバイスとその製造方法 | |
| US4232109A (en) | Method for manufacturing subminiature quartz crystal vibrator | |
| JPH05315881A (ja) | 水晶振動子の製造方法 | |
| KR100434616B1 (ko) | 압전 소자의 제조 방법 | |
| JPS58137318A (ja) | 薄膜圧電振動子 | |
| JPS61218214A (ja) | 圧電薄膜共振子 | |
| JPS6346605B2 (en, 2012) | ||
| JPH04294622A (ja) | 圧電素子の製造方法 | |
| JPS6173409A (ja) | 弾性表面波装置 | |
| JPS60145715A (ja) | 圧電共振子形成用基板の製造方法 | |
| JP5864140B2 (ja) | 圧電振動子、およびその製造方法 |