JPS6127735B2 - - Google Patents

Info

Publication number
JPS6127735B2
JPS6127735B2 JP53048837A JP4883778A JPS6127735B2 JP S6127735 B2 JPS6127735 B2 JP S6127735B2 JP 53048837 A JP53048837 A JP 53048837A JP 4883778 A JP4883778 A JP 4883778A JP S6127735 B2 JPS6127735 B2 JP S6127735B2
Authority
JP
Japan
Prior art keywords
photosensitive
photosensitive resin
water
layer
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53048837A
Other languages
English (en)
Japanese (ja)
Other versions
JPS54141128A (en
Inventor
Yasuo Washisawa
Fumiaki Shinozaki
Tomoaki Ikeda
Sho Nakao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP4883778A priority Critical patent/JPS54141128A/ja
Priority to DE19792916384 priority patent/DE2916384A1/de
Priority to GB7914238A priority patent/GB2019593B/en
Publication of JPS54141128A publication Critical patent/JPS54141128A/ja
Priority to US06/357,114 priority patent/US4411983A/en
Publication of JPS6127735B2 publication Critical patent/JPS6127735B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Manufacturing Optical Record Carriers (AREA)
JP4883778A 1978-04-25 1978-04-25 Processing method of picture image forming material Granted JPS54141128A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP4883778A JPS54141128A (en) 1978-04-25 1978-04-25 Processing method of picture image forming material
DE19792916384 DE2916384A1 (de) 1978-04-25 1979-04-23 Verfahren zur behandlung eines bildausbildungsmaterials
GB7914238A GB2019593B (en) 1978-04-25 1979-04-24 Method of development processing a lightsensitive resin image-forming material
US06/357,114 US4411983A (en) 1978-04-25 1982-03-11 Method for processing an image-forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4883778A JPS54141128A (en) 1978-04-25 1978-04-25 Processing method of picture image forming material

Publications (2)

Publication Number Publication Date
JPS54141128A JPS54141128A (en) 1979-11-02
JPS6127735B2 true JPS6127735B2 (en, 2012) 1986-06-26

Family

ID=12814349

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4883778A Granted JPS54141128A (en) 1978-04-25 1978-04-25 Processing method of picture image forming material

Country Status (4)

Country Link
US (1) US4411983A (en, 2012)
JP (1) JPS54141128A (en, 2012)
DE (1) DE2916384A1 (en, 2012)
GB (1) GB2019593B (en, 2012)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4555475A (en) * 1982-01-15 1985-11-26 Crossfield Electronic Limited Method of making a planographic printing member with aluminium silicate
JPS5953840A (ja) * 1982-09-20 1984-03-28 Mitsubishi Electric Corp 水溶性レジストの微細パタ−ン形成方法
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist
EP0164083B1 (de) * 1984-06-07 1991-05-02 Hoechst Aktiengesellschaft Positiv arbeitende strahlungsempfindliche Beschichtungslösung
US5143814A (en) * 1984-06-11 1992-09-01 Hoechst Celanese Corporation Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate
US4550069A (en) * 1984-06-11 1985-10-29 American Hoechst Corporation Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US4617251A (en) * 1985-04-11 1986-10-14 Olin Hunt Specialty Products, Inc. Stripping composition and method of using the same
US4592992A (en) * 1985-04-11 1986-06-03 American Hoechst Corporation Developer compositions for lithographic plates
US5080999A (en) * 1985-06-10 1992-01-14 Fuji Photo Film Co., Ltd. Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide
US4806458A (en) * 1985-10-28 1989-02-21 Hoechst Celanese Corporation Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate
US4692398A (en) * 1985-10-28 1987-09-08 American Hoechst Corporation Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate
US4948697A (en) * 1985-10-28 1990-08-14 Hoechst Celanese Corporation Positive photoresist with a solvent mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
US4983490A (en) * 1985-10-28 1991-01-08 Hoechst Celanese Corporation Photoresist treating composition consisting of a mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
US5039594A (en) * 1985-10-28 1991-08-13 Hoechst Celanese Corporation Positive photoresist containing a mixture of propylene glycol alkyl ethers and propylene glycol alkyl ether acetate
EP0221428B1 (de) * 1985-10-28 1989-11-23 Hoechst Celanese Corporation Behandlungsflüssigkeit für ein Photoresistgemisch und hierfür geeignetes Verfahren
DE3705896A1 (de) * 1986-02-24 1987-08-27 Tokyo Ohka Kogyo Co Ltd Verfahren zur herstellung eines fotoresistmusters auf einer substratflaeche und ein dafuer geeignetes schaumentfernungsmittel
JPH0638160B2 (ja) * 1986-02-24 1994-05-18 東京応化工業株式会社 ポジ型ホトレジストのスカム除去剤
JPH0721638B2 (ja) * 1986-07-18 1995-03-08 東京応化工業株式会社 基板の処理方法
US4806506A (en) * 1987-09-14 1989-02-21 E. I. Du Pont De Nemours And Company Process for detackifying photopolymer flexographic printing plates
US4883744A (en) * 1988-05-17 1989-11-28 International Business Machines Corporation Forming a polymide pattern on a substrate
JP3001607B2 (ja) * 1989-04-24 2000-01-24 シーメンス、アクチエンゲゼルシヤフト 二層法における寸法安定な構造転写方法
JP4159094B2 (ja) * 2003-10-15 2008-10-01 東京応化工業株式会社 感光性樹脂組成物およびこれを用いた感光性ドライフィルム
US20070281154A1 (en) * 2006-05-31 2007-12-06 Lace Lastics Company, Inc. Fabrics with Silver-Containing Yarn for Health Care Facility Rooms
TW201026513A (en) * 2009-01-08 2010-07-16 Univ Nat Cheng Kung Imprinting process of polyimide
GB2468297B (en) 2009-03-03 2014-11-19 Dyson Technology Ltd Electric machine with an asymmetric stator core

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1572153B2 (de) * 1966-06-27 1971-07-22 E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) Fotopolymerisierbares aufzeichnungsmaterial
NL6800538A (en, 2012) * 1968-01-12 1969-07-15
DE2150691C2 (de) * 1971-10-12 1982-09-09 Basf Ag, 6700 Ludwigshafen Lichtempfindliches Gemisch und Verwendung eines lichtempfindlichen Gemisches zur Herstellung einer Flachdruckplatte
JPS4935164U (en, 2012) * 1972-06-23 1974-03-28
US3891439A (en) * 1972-11-02 1975-06-24 Polychrome Corp Aqueous developing composition for lithographic diazo printing plates
US3929489A (en) * 1973-09-14 1975-12-30 Eastman Kodak Co Lithographic plates having radiation sensitive elements developable with aqueous alcohol
JPS51119227A (en) * 1975-04-02 1976-10-19 Hitachi Ltd Method of preparing an uneven image formation
JPS5266002A (en) * 1975-11-26 1977-06-01 Fuji Photo Film Co Ltd Desensitizer for lithographic press plate
CA1090189A (en) * 1976-05-03 1980-11-25 American Hoechst Corporation Lithographic plate finisher comprising a solvent phase and an aqueous phase containing tapioca dextrin
US4130425A (en) * 1976-12-29 1978-12-19 Marcole, Inc. Subtractive developer for lithographic plates
US4212935A (en) * 1978-02-24 1980-07-15 International Business Machines Corporation Method of modifying the development profile of photoresists
JPS54116925A (en) * 1978-03-03 1979-09-11 Hitachi Ltd Development of photoresist

Also Published As

Publication number Publication date
JPS54141128A (en) 1979-11-02
DE2916384A1 (de) 1979-11-08
GB2019593B (en) 1982-07-28
GB2019593A (en) 1979-10-31
US4411983A (en) 1983-10-25

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