JPS6127535A - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物

Info

Publication number
JPS6127535A
JPS6127535A JP14873484A JP14873484A JPS6127535A JP S6127535 A JPS6127535 A JP S6127535A JP 14873484 A JP14873484 A JP 14873484A JP 14873484 A JP14873484 A JP 14873484A JP S6127535 A JPS6127535 A JP S6127535A
Authority
JP
Japan
Prior art keywords
compound
photosensitive resin
resin composition
compd
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14873484A
Other languages
English (en)
Japanese (ja)
Other versions
JPH036496B2 (cg-RX-API-DMAC7.html
Inventor
Kunio Yanagisawa
柳沢　邦夫
Yasuhiko Araki
泰彦 荒木
Hajime Shiyoubi
初 松扉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP14873484A priority Critical patent/JPS6127535A/ja
Publication of JPS6127535A publication Critical patent/JPS6127535A/ja
Publication of JPH036496B2 publication Critical patent/JPH036496B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP14873484A 1984-07-17 1984-07-17 感光性樹脂組成物 Granted JPS6127535A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14873484A JPS6127535A (ja) 1984-07-17 1984-07-17 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14873484A JPS6127535A (ja) 1984-07-17 1984-07-17 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6127535A true JPS6127535A (ja) 1986-02-07
JPH036496B2 JPH036496B2 (cg-RX-API-DMAC7.html) 1991-01-30

Family

ID=15459413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14873484A Granted JPS6127535A (ja) 1984-07-17 1984-07-17 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS6127535A (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6311930A (ja) * 1986-07-03 1988-01-19 Mitsui Toatsu Chem Inc 感光性樹脂組成物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5830748A (ja) * 1981-08-07 1983-02-23 バスフ・アクチエンゲゼルシヤフト フオトレジスト層の製造に適する光重合性印画用組成物

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5830748A (ja) * 1981-08-07 1983-02-23 バスフ・アクチエンゲゼルシヤフト フオトレジスト層の製造に適する光重合性印画用組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6311930A (ja) * 1986-07-03 1988-01-19 Mitsui Toatsu Chem Inc 感光性樹脂組成物

Also Published As

Publication number Publication date
JPH036496B2 (cg-RX-API-DMAC7.html) 1991-01-30

Similar Documents

Publication Publication Date Title
EP0999473B1 (en) Photosensitive layer
US4272607A (en) Photosensitive resin composition
US4454219A (en) Photosensitive resin composition comprised of a polymer obtained from an aliphatic amino group-containing monomer as a comonomer
JPH0792602B2 (ja) 放射線重合性コンパウンド、放射線重合性複写材料、およびソルダーマスクの製造法
JP3199600B2 (ja) 感光性樹脂組成物及びこれを用いた感光性エレメント
JPS6127535A (ja) 感光性樹脂組成物
JPH02166452A (ja) アルカリ現像型感光性樹脂組成物
JPS6125139A (ja) 感光性樹脂組成物
JPS6331496B2 (cg-RX-API-DMAC7.html)
JPS60112035A (ja) 感光性ソルダ−レジスト
JPH0327106B2 (cg-RX-API-DMAC7.html)
JPH0528827B2 (cg-RX-API-DMAC7.html)
JPS60103346A (ja) 感光性樹脂組成物
JP3415919B2 (ja) 感光性樹脂組成物及びこれを用いた感光性エレメント
JPS6091352A (ja) 感光性樹脂組成物
JP4000839B2 (ja) 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JPH0332780B2 (cg-RX-API-DMAC7.html)
JPH02311846A (ja) 感光性樹脂組成物及びこれを用いた感光性積層体
JP2002207292A (ja) 感光性樹脂組成物及びこれを用いた感光性エレメント
JPS628141A (ja) 光重合性組成物
JPS6088940A (ja) 感光性樹脂組成物
JPH0351853A (ja) 感光性樹脂組成物及び感光性積層体
JPH01309050A (ja) 感光性樹脂組成物および感光性フイルム
JPS63169637A (ja) 難燃型感光性樹脂組成物
JP3750755B2 (ja) 感光性樹脂組成物及びこれを用いた感光性エレメント