Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi LtdfiledCriticalHitachi Ltd
Priority to JP18536281ApriorityCriticalpatent/JPS5887271A/ja
Publication of JPS5887271ApublicationCriticalpatent/JPS5887271A/ja
Publication of JPS6127463B2publicationCriticalpatent/JPS6127463B2/ja
H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
H01J37/32—Gas-filled discharge tubes
H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
H01J37/3405—Magnetron sputtering
H01J37/3408—Planar magnetron sputtering
Landscapes
Physics & Mathematics
(AREA)
Engineering & Computer Science
(AREA)
Plasma & Fusion
(AREA)
Chemical & Material Sciences
(AREA)
Analytical Chemistry
(AREA)
Physical Vapour Deposition
(AREA)
Electrodes Of Semiconductors
(AREA)
Physical Deposition Of Substances That Are Components Of Semiconductor Devices
(AREA)