JPS61271738A - 機械走査とビーム走査を併用したイオン打ち込み装置 - Google Patents

機械走査とビーム走査を併用したイオン打ち込み装置

Info

Publication number
JPS61271738A
JPS61271738A JP60113820A JP11382085A JPS61271738A JP S61271738 A JPS61271738 A JP S61271738A JP 60113820 A JP60113820 A JP 60113820A JP 11382085 A JP11382085 A JP 11382085A JP S61271738 A JPS61271738 A JP S61271738A
Authority
JP
Japan
Prior art keywords
scanning
ion beam
mechanical
ion
rotating disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60113820A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0479102B2 (https=
Inventor
Toshimichi Taya
田谷　俊陸
Kuniyuki Sakumichi
訓之 作道
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60113820A priority Critical patent/JPS61271738A/ja
Publication of JPS61271738A publication Critical patent/JPS61271738A/ja
Publication of JPH0479102B2 publication Critical patent/JPH0479102B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP60113820A 1985-05-27 1985-05-27 機械走査とビーム走査を併用したイオン打ち込み装置 Granted JPS61271738A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60113820A JPS61271738A (ja) 1985-05-27 1985-05-27 機械走査とビーム走査を併用したイオン打ち込み装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60113820A JPS61271738A (ja) 1985-05-27 1985-05-27 機械走査とビーム走査を併用したイオン打ち込み装置

Publications (2)

Publication Number Publication Date
JPS61271738A true JPS61271738A (ja) 1986-12-02
JPH0479102B2 JPH0479102B2 (https=) 1992-12-15

Family

ID=14621861

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60113820A Granted JPS61271738A (ja) 1985-05-27 1985-05-27 機械走査とビーム走査を併用したイオン打ち込み装置

Country Status (1)

Country Link
JP (1) JPS61271738A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63301453A (ja) * 1987-06-01 1988-12-08 Hitachi Ltd イオン打込方法及びその装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63301453A (ja) * 1987-06-01 1988-12-08 Hitachi Ltd イオン打込方法及びその装置

Also Published As

Publication number Publication date
JPH0479102B2 (https=) 1992-12-15

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