JPH0479102B2 - - Google Patents
Info
- Publication number
- JPH0479102B2 JPH0479102B2 JP60113820A JP11382085A JPH0479102B2 JP H0479102 B2 JPH0479102 B2 JP H0479102B2 JP 60113820 A JP60113820 A JP 60113820A JP 11382085 A JP11382085 A JP 11382085A JP H0479102 B2 JPH0479102 B2 JP H0479102B2
- Authority
- JP
- Japan
- Prior art keywords
- scanning
- ion beam
- wafer
- rotating disk
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 40
- 238000005468 ion implantation Methods 0.000 claims description 15
- 239000007943 implant Substances 0.000 claims description 9
- 235000012431 wafers Nutrition 0.000 description 29
- 238000000034 method Methods 0.000 description 14
- 150000002500 ions Chemical class 0.000 description 11
- 238000002513 implantation Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000012856 packing Methods 0.000 description 2
- 238000009461 vacuum packaging Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60113820A JPS61271738A (ja) | 1985-05-27 | 1985-05-27 | 機械走査とビーム走査を併用したイオン打ち込み装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60113820A JPS61271738A (ja) | 1985-05-27 | 1985-05-27 | 機械走査とビーム走査を併用したイオン打ち込み装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61271738A JPS61271738A (ja) | 1986-12-02 |
| JPH0479102B2 true JPH0479102B2 (https=) | 1992-12-15 |
Family
ID=14621861
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60113820A Granted JPS61271738A (ja) | 1985-05-27 | 1985-05-27 | 機械走査とビーム走査を併用したイオン打ち込み装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61271738A (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2707080B2 (ja) * | 1987-06-01 | 1998-01-28 | 株式会社日立製作所 | イオン打込方法及びその装置 |
-
1985
- 1985-05-27 JP JP60113820A patent/JPS61271738A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61271738A (ja) | 1986-12-02 |
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