JPS61267042A - 感光性組成物 - Google Patents

感光性組成物

Info

Publication number
JPS61267042A
JPS61267042A JP60109122A JP10912285A JPS61267042A JP S61267042 A JPS61267042 A JP S61267042A JP 60109122 A JP60109122 A JP 60109122A JP 10912285 A JP10912285 A JP 10912285A JP S61267042 A JPS61267042 A JP S61267042A
Authority
JP
Japan
Prior art keywords
substituent
group
acid
photosensitive composition
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60109122A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0573016B2 (enExample
Inventor
Kazuo Maemoto
一夫 前本
Toshiyuki Sekiya
関屋　俊之
Toshiaki Aoai
利明 青合
Akihiko Kamiya
神谷　明彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP60109122A priority Critical patent/JPS61267042A/ja
Publication of JPS61267042A publication Critical patent/JPS61267042A/ja
Publication of JPH0573016B2 publication Critical patent/JPH0573016B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP60109122A 1985-05-21 1985-05-21 感光性組成物 Granted JPS61267042A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60109122A JPS61267042A (ja) 1985-05-21 1985-05-21 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60109122A JPS61267042A (ja) 1985-05-21 1985-05-21 感光性組成物

Publications (2)

Publication Number Publication Date
JPS61267042A true JPS61267042A (ja) 1986-11-26
JPH0573016B2 JPH0573016B2 (enExample) 1993-10-13

Family

ID=14502113

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60109122A Granted JPS61267042A (ja) 1985-05-21 1985-05-21 感光性組成物

Country Status (1)

Country Link
JP (1) JPS61267042A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63136039A (ja) * 1986-11-28 1988-06-08 Fuji Photo Film Co Ltd 感光性組成物
JPS63172711A (ja) * 1986-12-23 1988-07-16 アグファーゲーヴェルト　アクチエンゲゼルシャフト ポリビニルアセタール、これを含有する複写材料用感光性混合物
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
JPH05165206A (ja) * 1991-12-17 1993-07-02 Fuji Photo Film Co Ltd 感光性組成物

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54138090A (en) * 1978-04-18 1979-10-26 Sekisui Chem Co Ltd Photosensitive resin composition
JPS59136731A (ja) * 1983-01-26 1984-08-06 Kuraray Co Ltd 感光性樹脂組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54138090A (en) * 1978-04-18 1979-10-26 Sekisui Chem Co Ltd Photosensitive resin composition
JPS59136731A (ja) * 1983-01-26 1984-08-06 Kuraray Co Ltd 感光性樹脂組成物

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63136039A (ja) * 1986-11-28 1988-06-08 Fuji Photo Film Co Ltd 感光性組成物
JPS63172711A (ja) * 1986-12-23 1988-07-16 アグファーゲーヴェルト　アクチエンゲゼルシャフト ポリビニルアセタール、これを含有する複写材料用感光性混合物
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
JPH05165206A (ja) * 1991-12-17 1993-07-02 Fuji Photo Film Co Ltd 感光性組成物

Also Published As

Publication number Publication date
JPH0573016B2 (enExample) 1993-10-13

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