JPS61256636A - 縮小投影露光装置 - Google Patents

縮小投影露光装置

Info

Publication number
JPS61256636A
JPS61256636A JP60098473A JP9847385A JPS61256636A JP S61256636 A JPS61256636 A JP S61256636A JP 60098473 A JP60098473 A JP 60098473A JP 9847385 A JP9847385 A JP 9847385A JP S61256636 A JPS61256636 A JP S61256636A
Authority
JP
Japan
Prior art keywords
exposure
stage
reduction projection
mask
projection lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60098473A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0513370B2 (OSRAM
Inventor
Hisashi Takahashi
久 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP60098473A priority Critical patent/JPS61256636A/ja
Publication of JPS61256636A publication Critical patent/JPS61256636A/ja
Publication of JPH0513370B2 publication Critical patent/JPH0513370B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • H10P95/00—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60098473A 1985-05-09 1985-05-09 縮小投影露光装置 Granted JPS61256636A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60098473A JPS61256636A (ja) 1985-05-09 1985-05-09 縮小投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60098473A JPS61256636A (ja) 1985-05-09 1985-05-09 縮小投影露光装置

Publications (2)

Publication Number Publication Date
JPS61256636A true JPS61256636A (ja) 1986-11-14
JPH0513370B2 JPH0513370B2 (OSRAM) 1993-02-22

Family

ID=14220630

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60098473A Granted JPS61256636A (ja) 1985-05-09 1985-05-09 縮小投影露光装置

Country Status (1)

Country Link
JP (1) JPS61256636A (OSRAM)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6224624A (ja) * 1985-07-24 1987-02-02 Nippon Kogaku Kk <Nikon> 露光方法及びフォトリソグラフィ装置
JPS6313331A (ja) * 1986-07-04 1988-01-20 Hitachi Ltd 縮小投影露光装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53132270A (en) * 1977-04-20 1978-11-17 Thomson Csf Optical device for projecting pattern
JPS58110040A (ja) * 1981-12-23 1983-06-30 Fujitsu Ltd パタ−ン形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53132270A (en) * 1977-04-20 1978-11-17 Thomson Csf Optical device for projecting pattern
JPS58110040A (ja) * 1981-12-23 1983-06-30 Fujitsu Ltd パタ−ン形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6224624A (ja) * 1985-07-24 1987-02-02 Nippon Kogaku Kk <Nikon> 露光方法及びフォトリソグラフィ装置
JPS6313331A (ja) * 1986-07-04 1988-01-20 Hitachi Ltd 縮小投影露光装置

Also Published As

Publication number Publication date
JPH0513370B2 (OSRAM) 1993-02-22

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