JPS61251705A - パタ−ン検査方法及び装置 - Google Patents

パタ−ン検査方法及び装置

Info

Publication number
JPS61251705A
JPS61251705A JP60094353A JP9435385A JPS61251705A JP S61251705 A JPS61251705 A JP S61251705A JP 60094353 A JP60094353 A JP 60094353A JP 9435385 A JP9435385 A JP 9435385A JP S61251705 A JPS61251705 A JP S61251705A
Authority
JP
Japan
Prior art keywords
pattern
image
inspection
inspected
width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60094353A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0513443B2 (enrdf_load_stackoverflow
Inventor
Kiyotaka Inada
稲田　清崇
Shuji Matsumoto
修二 松本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Industries Ltd filed Critical Sumitomo Metal Industries Ltd
Priority to JP60094353A priority Critical patent/JPS61251705A/ja
Publication of JPS61251705A publication Critical patent/JPS61251705A/ja
Publication of JPH0513443B2 publication Critical patent/JPH0513443B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Closed-Circuit Television Systems (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Image Analysis (AREA)
JP60094353A 1985-04-30 1985-04-30 パタ−ン検査方法及び装置 Granted JPS61251705A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60094353A JPS61251705A (ja) 1985-04-30 1985-04-30 パタ−ン検査方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60094353A JPS61251705A (ja) 1985-04-30 1985-04-30 パタ−ン検査方法及び装置

Publications (2)

Publication Number Publication Date
JPS61251705A true JPS61251705A (ja) 1986-11-08
JPH0513443B2 JPH0513443B2 (enrdf_load_stackoverflow) 1993-02-22

Family

ID=14107918

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60094353A Granted JPS61251705A (ja) 1985-04-30 1985-04-30 パタ−ン検査方法及び装置

Country Status (1)

Country Link
JP (1) JPS61251705A (enrdf_load_stackoverflow)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62150608U (enrdf_load_stackoverflow) * 1986-03-14 1987-09-24
JPS62249037A (ja) * 1986-04-21 1987-10-30 Shigumatsukusu Kk 物体認識装置
JPS63167980A (ja) * 1986-12-30 1988-07-12 Narumi China Corp プリント配線パタ−ン等の欠陥検査方法およびその装置
JPH01292206A (ja) * 1988-05-19 1989-11-24 Nikon Corp 物体の表面状態測定装置及び表面の高さ測定装置
JPH02173873A (ja) * 1988-12-26 1990-07-05 Nec Corp 欠陥判定器
JPH04278401A (ja) * 1991-03-06 1992-10-05 Yokokawa Buritsuji:Kk 平面形状の測定方法
JPH04348050A (ja) * 1990-11-30 1992-12-03 Mitsui Mining & Smelting Co Ltd 材料表面検査装置
JPH0545135A (ja) * 1990-12-26 1993-02-23 Ind Technol Res Inst 精密輪郭の視覚測定方法及び装置
JPH05240801A (ja) * 1992-02-27 1993-09-21 Dainippon Screen Mfg Co Ltd 画像パターンの検査方法及びその装置
WO1994024518A1 (en) * 1993-04-21 1994-10-27 Omron Corporation Visual inspection support apparatus, substrate inspection apparatus, and soldering inspection and correction methods using the same apparatuses
US5850467A (en) * 1990-11-05 1998-12-15 Fujitsu Limited Image data inspecting method and apparatus providing for equal sizing of first and second image data to be compared
JP2008129569A (ja) * 2006-11-24 2008-06-05 Hynix Semiconductor Inc 回路レイアウトを用いて半導体素子の自己組立ダミーパターンを挿入する方法
JP2016038314A (ja) * 2014-08-08 2016-03-22 株式会社ニューフレアテクノロジー マスク検査装置及びマスク検査方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021140866A1 (ja) * 2020-01-10 2021-07-15 株式会社ニューフレアテクノロジー パターン検査装置及びパターン検査方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57107046A (en) * 1980-12-18 1982-07-03 Ibm Article inspecting device
JPS57194304A (en) * 1981-05-27 1982-11-29 Hitachi Ltd Inspecting method for circuit pattern
JPS5861448A (ja) * 1981-10-09 1983-04-12 Hitachi Ltd パタ−ン検査方式
JPS6015504A (ja) * 1983-07-07 1985-01-26 Mitsubishi Rayon Co Ltd フオトマスク自動検査装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57107046A (en) * 1980-12-18 1982-07-03 Ibm Article inspecting device
JPS57194304A (en) * 1981-05-27 1982-11-29 Hitachi Ltd Inspecting method for circuit pattern
JPS5861448A (ja) * 1981-10-09 1983-04-12 Hitachi Ltd パタ−ン検査方式
JPS6015504A (ja) * 1983-07-07 1985-01-26 Mitsubishi Rayon Co Ltd フオトマスク自動検査装置

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62150608U (enrdf_load_stackoverflow) * 1986-03-14 1987-09-24
JPS62249037A (ja) * 1986-04-21 1987-10-30 Shigumatsukusu Kk 物体認識装置
JPS63167980A (ja) * 1986-12-30 1988-07-12 Narumi China Corp プリント配線パタ−ン等の欠陥検査方法およびその装置
JPH01292206A (ja) * 1988-05-19 1989-11-24 Nikon Corp 物体の表面状態測定装置及び表面の高さ測定装置
JPH02173873A (ja) * 1988-12-26 1990-07-05 Nec Corp 欠陥判定器
US5850467A (en) * 1990-11-05 1998-12-15 Fujitsu Limited Image data inspecting method and apparatus providing for equal sizing of first and second image data to be compared
JPH04348050A (ja) * 1990-11-30 1992-12-03 Mitsui Mining & Smelting Co Ltd 材料表面検査装置
JPH0545135A (ja) * 1990-12-26 1993-02-23 Ind Technol Res Inst 精密輪郭の視覚測定方法及び装置
JPH04278401A (ja) * 1991-03-06 1992-10-05 Yokokawa Buritsuji:Kk 平面形状の測定方法
JPH05240801A (ja) * 1992-02-27 1993-09-21 Dainippon Screen Mfg Co Ltd 画像パターンの検査方法及びその装置
WO1994024518A1 (en) * 1993-04-21 1994-10-27 Omron Corporation Visual inspection support apparatus, substrate inspection apparatus, and soldering inspection and correction methods using the same apparatuses
US6362877B1 (en) 1993-04-21 2002-03-26 Omron Corporation Visual inspection supporting apparatus and printed circuit board inspecting apparatus, and methods of soldering inspection and correction using the apparatuses
JP2008129569A (ja) * 2006-11-24 2008-06-05 Hynix Semiconductor Inc 回路レイアウトを用いて半導体素子の自己組立ダミーパターンを挿入する方法
JP2016038314A (ja) * 2014-08-08 2016-03-22 株式会社ニューフレアテクノロジー マスク検査装置及びマスク検査方法

Also Published As

Publication number Publication date
JPH0513443B2 (enrdf_load_stackoverflow) 1993-02-22

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