JPS61250506A - 整合修正装置 - Google Patents

整合修正装置

Info

Publication number
JPS61250506A
JPS61250506A JP61015981A JP1598186A JPS61250506A JP S61250506 A JPS61250506 A JP S61250506A JP 61015981 A JP61015981 A JP 61015981A JP 1598186 A JP1598186 A JP 1598186A JP S61250506 A JPS61250506 A JP S61250506A
Authority
JP
Japan
Prior art keywords
intensity
focus
diffracted beam
tool
tilt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61015981A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0588835B2 (cg-RX-API-DMAC7.html
Inventor
アンソニー・ジユリアナ、ジユニア
ミルトン・ラツセル・ラツタ
グレン・タヴアーニア・シンサボツクス
カールトン・グランド・ウイルソン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS61250506A publication Critical patent/JPS61250506A/ja
Publication of JPH0588835B2 publication Critical patent/JPH0588835B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP61015981A 1985-04-26 1986-01-29 整合修正装置 Granted JPS61250506A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US727644 1985-04-26
US06/727,644 US4645338A (en) 1985-04-26 1985-04-26 Optical system for focus correction for a lithographic tool

Publications (2)

Publication Number Publication Date
JPS61250506A true JPS61250506A (ja) 1986-11-07
JPH0588835B2 JPH0588835B2 (cg-RX-API-DMAC7.html) 1993-12-24

Family

ID=24923439

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61015981A Granted JPS61250506A (ja) 1985-04-26 1986-01-29 整合修正装置

Country Status (4)

Country Link
US (1) US4645338A (cg-RX-API-DMAC7.html)
EP (1) EP0199014B1 (cg-RX-API-DMAC7.html)
JP (1) JPS61250506A (cg-RX-API-DMAC7.html)
DE (1) DE3688475D1 (cg-RX-API-DMAC7.html)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5898479A (en) * 1997-07-10 1999-04-27 Vlsi Technology, Inc. System for monitoring optical properties of photolithography equipment
WO2002011004A1 (en) * 2000-07-27 2002-02-07 Yozan Inc. Authentication managing apparatus, and shop communication terminal
JP2002277967A (ja) * 2001-03-16 2002-09-25 Fuji Photo Film Co Ltd ピント調整検査器及びピント調整方法
JP2005505929A (ja) * 2001-10-10 2005-02-24 アクセント オプティカル テクノロジーズ，インク． 断面解析による焦点中心の決定
US6885429B2 (en) * 2002-06-28 2005-04-26 Asml Holding N.V. System and method for automated focus measuring of a lithography tool
US20060136717A1 (en) 2004-12-20 2006-06-22 Mark Buer System and method for authentication via a proximate device
US8295484B2 (en) * 2004-12-21 2012-10-23 Broadcom Corporation System and method for securing data from a remote input device
JP2007317960A (ja) * 2006-05-26 2007-12-06 Canon Inc 露光条件の検出方法及び装置、並びに、露光装置
TWI383273B (zh) 2007-11-20 2013-01-21 Asml Netherlands Bv 微影投射裝置之焦點測量方法及微影投射裝置之校準方法
US9798225B2 (en) 2013-11-05 2017-10-24 Asml Netherlands B.V. Method of characterizing, method of forming a model, method of simulating, mask manufacturing method and device manufacturing method

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1447450A1 (de) * 1963-06-14 1968-10-31 Agfa Ag Entfernungsmess- oder Steuervorrichtung
US3945023A (en) * 1974-03-29 1976-03-16 Honeywell Inc. Auto-focus camera with solid state range finder
US4201456A (en) * 1976-04-22 1980-05-06 Wolbarsht Myron L Method and apparatus for detecting the focusing condition of an optical system
DE2622283A1 (de) * 1976-05-19 1977-12-08 Bosch Gmbh Robert Verfahren zur lokalisierung eines festkoerperplaettchens und festkoerperplaettchen zur durchfuehrung des verfahrens
JPS5413330A (en) * 1977-07-01 1979-01-31 Olympus Optical Co Ltd Automatic focus adjusting system
US4211489A (en) * 1978-01-16 1980-07-08 Rca Corporation Photomask alignment system
JPS5576310A (en) * 1978-12-05 1980-06-09 Nippon Kogaku Kk <Nikon> Automatic focusing device
US4327292A (en) * 1980-05-13 1982-04-27 Hughes Aircraft Company Alignment process using serial detection of repetitively patterned alignment marks
JPS57192929A (en) * 1981-05-25 1982-11-27 Hitachi Ltd Projector provided with automatic focusing function
JPS5897009A (ja) * 1981-12-04 1983-06-09 Olympus Optical Co Ltd 自動焦点調節方法
US4549084A (en) * 1982-12-21 1985-10-22 The Perkin-Elmer Corporation Alignment and focusing system for a scanning mask aligner
JPS59121932A (ja) * 1982-12-28 1984-07-14 Fujitsu Ltd 自動焦点制御装置
US4583852A (en) * 1983-03-31 1986-04-22 The Perkin-Elmer Corporation Attitude transfer system
US4585337A (en) * 1985-01-14 1986-04-29 Phillips Edward H Step-and-repeat alignment and exposure system

Also Published As

Publication number Publication date
DE3688475D1 (de) 1993-07-01
US4645338A (en) 1987-02-24
EP0199014A2 (en) 1986-10-29
EP0199014A3 (en) 1988-12-07
JPH0588835B2 (cg-RX-API-DMAC7.html) 1993-12-24
EP0199014B1 (en) 1993-05-26

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