JPS6124816B2 - - Google Patents
Info
- Publication number
- JPS6124816B2 JPS6124816B2 JP52120735A JP12073577A JPS6124816B2 JP S6124816 B2 JPS6124816 B2 JP S6124816B2 JP 52120735 A JP52120735 A JP 52120735A JP 12073577 A JP12073577 A JP 12073577A JP S6124816 B2 JPS6124816 B2 JP S6124816B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- wafer
- photoelectric
- scribe line
- alignment mark
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 235000012431 wafers Nutrition 0.000 claims description 67
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 239000004065 semiconductor Substances 0.000 claims description 6
- 238000000605 extraction Methods 0.000 claims description 2
- 238000001514 detection method Methods 0.000 description 37
- 210000001747 pupil Anatomy 0.000 description 28
- 230000003287 optical effect Effects 0.000 description 23
- 238000000034 method Methods 0.000 description 19
- 238000010586 diagram Methods 0.000 description 17
- 238000003384 imaging method Methods 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- 230000000007 visual effect Effects 0.000 description 5
- 239000000428 dust Substances 0.000 description 4
- 238000005286 illumination Methods 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 1
- 241000276498 Pollachius virens Species 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000002508 contact lithography Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12073577A JPS5453967A (en) | 1977-10-07 | 1977-10-07 | Mask and wafer for semiconductor circuit manufacture and their alignment unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12073577A JPS5453967A (en) | 1977-10-07 | 1977-10-07 | Mask and wafer for semiconductor circuit manufacture and their alignment unit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5453967A JPS5453967A (en) | 1979-04-27 |
| JPS6124816B2 true JPS6124816B2 (de) | 1986-06-12 |
Family
ID=14793682
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12073577A Granted JPS5453967A (en) | 1977-10-07 | 1977-10-07 | Mask and wafer for semiconductor circuit manufacture and their alignment unit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5453967A (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5719726A (en) * | 1980-07-10 | 1982-02-02 | Nippon Kogaku Kk <Nikon> | Positioning device |
| JPS5788414A (en) * | 1980-11-21 | 1982-06-02 | Seiko Epson Corp | Alignment device |
| JPH0722179B2 (ja) * | 1985-12-27 | 1995-03-08 | 日本電気株式会社 | 半導体ウエ−ハの位置合せマ−クの形成方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5176979A (ja) * | 1974-12-27 | 1976-07-03 | Hitachi Ltd | Ichiseigosochi |
| JPS51140575A (en) * | 1975-05-30 | 1976-12-03 | Hitachi Ltd | Photomask |
-
1977
- 1977-10-07 JP JP12073577A patent/JPS5453967A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5176979A (ja) * | 1974-12-27 | 1976-07-03 | Hitachi Ltd | Ichiseigosochi |
| JPS51140575A (en) * | 1975-05-30 | 1976-12-03 | Hitachi Ltd | Photomask |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5453967A (en) | 1979-04-27 |
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