JPS61236184A - 半導体レ−ザ素子の製造方法 - Google Patents
半導体レ−ザ素子の製造方法Info
- Publication number
- JPS61236184A JPS61236184A JP7667785A JP7667785A JPS61236184A JP S61236184 A JPS61236184 A JP S61236184A JP 7667785 A JP7667785 A JP 7667785A JP 7667785 A JP7667785 A JP 7667785A JP S61236184 A JPS61236184 A JP S61236184A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- implanted
- semiconductor laser
- mqw
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Semiconductor Lasers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7667785A JPS61236184A (ja) | 1985-04-12 | 1985-04-12 | 半導体レ−ザ素子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7667785A JPS61236184A (ja) | 1985-04-12 | 1985-04-12 | 半導体レ−ザ素子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61236184A true JPS61236184A (ja) | 1986-10-21 |
| JPH0149030B2 JPH0149030B2 (enrdf_load_stackoverflow) | 1989-10-23 |
Family
ID=13612059
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7667785A Granted JPS61236184A (ja) | 1985-04-12 | 1985-04-12 | 半導体レ−ザ素子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61236184A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6236886A (ja) * | 1985-08-12 | 1987-02-17 | Hitachi Ltd | 半導体構造体とその製造方法 |
| US4980313A (en) * | 1989-01-24 | 1990-12-25 | Mitsubishi Denki Kabushiki Kaisha | Method of producing a semiconductor laser |
| JPH04127489A (ja) * | 1988-12-21 | 1992-04-28 | Hikari Keisoku Gijutsu Kaihatsu Kk | 半導体光集積回路の製造方法 |
| US5238868A (en) * | 1989-11-30 | 1993-08-24 | Gte Laboratories Incorporated | Bandgap tuning of semiconductor quantum well structures |
| WO1996019856A1 (en) * | 1994-12-22 | 1996-06-27 | Polaroid Corporation | Laser diode with an ion-implanted region |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58500681A (ja) * | 1981-05-06 | 1983-04-28 | ユニバ−シテイ オブ イリノイ フアンデ−シヨン | 半導体装置の製造方法 |
-
1985
- 1985-04-12 JP JP7667785A patent/JPS61236184A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58500681A (ja) * | 1981-05-06 | 1983-04-28 | ユニバ−シテイ オブ イリノイ フアンデ−シヨン | 半導体装置の製造方法 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6236886A (ja) * | 1985-08-12 | 1987-02-17 | Hitachi Ltd | 半導体構造体とその製造方法 |
| JPH04127489A (ja) * | 1988-12-21 | 1992-04-28 | Hikari Keisoku Gijutsu Kaihatsu Kk | 半導体光集積回路の製造方法 |
| US4980313A (en) * | 1989-01-24 | 1990-12-25 | Mitsubishi Denki Kabushiki Kaisha | Method of producing a semiconductor laser |
| US5238868A (en) * | 1989-11-30 | 1993-08-24 | Gte Laboratories Incorporated | Bandgap tuning of semiconductor quantum well structures |
| WO1996019856A1 (en) * | 1994-12-22 | 1996-06-27 | Polaroid Corporation | Laser diode with an ion-implanted region |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0149030B2 (enrdf_load_stackoverflow) | 1989-10-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |