JPS6122899B2 - - Google Patents
Info
- Publication number
- JPS6122899B2 JPS6122899B2 JP9363979A JP9363979A JPS6122899B2 JP S6122899 B2 JPS6122899 B2 JP S6122899B2 JP 9363979 A JP9363979 A JP 9363979A JP 9363979 A JP9363979 A JP 9363979A JP S6122899 B2 JPS6122899 B2 JP S6122899B2
- Authority
- JP
- Japan
- Prior art keywords
- upper layer
- gas
- heat generating
- bridge
- cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004020 conductor Substances 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 239000012777 electrically insulating material Substances 0.000 claims 1
- 239000003779 heat-resistant material Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 description 19
- 229910004298 SiO 2 Inorganic materials 0.000 description 8
- 238000005530 etching Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 5
- 238000001514 detection method Methods 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 230000007257 malfunction Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000007084 catalytic combustion reaction Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Landscapes
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9363979A JPS5618751A (en) | 1979-07-25 | 1979-07-25 | Gas detector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9363979A JPS5618751A (en) | 1979-07-25 | 1979-07-25 | Gas detector |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5618751A JPS5618751A (en) | 1981-02-21 |
| JPS6122899B2 true JPS6122899B2 (en, 2012) | 1986-06-03 |
Family
ID=14087915
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9363979A Granted JPS5618751A (en) | 1979-07-25 | 1979-07-25 | Gas detector |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5618751A (en, 2012) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4542650A (en) * | 1983-08-26 | 1985-09-24 | Innovus | Thermal mass flow meter |
| JPS6295454A (ja) * | 1985-10-22 | 1987-05-01 | Nippon Telegr & Teleph Corp <Ntt> | マイクロガスセンサおよびその製造方法 |
| AT396998B (de) * | 1985-12-09 | 1994-01-25 | Ottosensors Corp | Messeinrichtungen und rohranschluss sowie verfahren zur herstellung einer messeinrichtung und verfahren zur verbindung von rohren mit einer messeinrichtung bzw. zur herstellung von rohranschlüssen |
| JPH01299452A (ja) * | 1988-05-27 | 1989-12-04 | Ricoh Co Ltd | ４端子検出型ガス検出装置 |
-
1979
- 1979-07-25 JP JP9363979A patent/JPS5618751A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5618751A (en) | 1981-02-21 |
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