JPS61227166A - スパツタリング用ビスマスまたはビスマス含有タ−ゲツト - Google Patents

スパツタリング用ビスマスまたはビスマス含有タ−ゲツト

Info

Publication number
JPS61227166A
JPS61227166A JP6616685A JP6616685A JPS61227166A JP S61227166 A JPS61227166 A JP S61227166A JP 6616685 A JP6616685 A JP 6616685A JP 6616685 A JP6616685 A JP 6616685A JP S61227166 A JPS61227166 A JP S61227166A
Authority
JP
Japan
Prior art keywords
bismuth
target
target body
metal
backing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6616685A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0368947B2 (enrdf_load_stackoverflow
Inventor
Masatoshi Fukushima
正俊 福島
Kosaburo Suehiro
末広　幸三郎
Soichi Fukui
福井　総一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP6616685A priority Critical patent/JPS61227166A/ja
Publication of JPS61227166A publication Critical patent/JPS61227166A/ja
Publication of JPH0368947B2 publication Critical patent/JPH0368947B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP6616685A 1985-03-29 1985-03-29 スパツタリング用ビスマスまたはビスマス含有タ−ゲツト Granted JPS61227166A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6616685A JPS61227166A (ja) 1985-03-29 1985-03-29 スパツタリング用ビスマスまたはビスマス含有タ−ゲツト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6616685A JPS61227166A (ja) 1985-03-29 1985-03-29 スパツタリング用ビスマスまたはビスマス含有タ−ゲツト

Publications (2)

Publication Number Publication Date
JPS61227166A true JPS61227166A (ja) 1986-10-09
JPH0368947B2 JPH0368947B2 (enrdf_load_stackoverflow) 1991-10-30

Family

ID=13307990

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6616685A Granted JPS61227166A (ja) 1985-03-29 1985-03-29 スパツタリング用ビスマスまたはビスマス含有タ−ゲツト

Country Status (1)

Country Link
JP (1) JPS61227166A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02267261A (ja) * 1989-04-06 1990-11-01 Kojundo Chem Lab Co Ltd スパッタリングターゲットの製造方法
JP5026611B1 (ja) * 2011-09-21 2012-09-12 Ｊｘ日鉱日石金属株式会社 積層構造体及びその製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5633476A (en) * 1979-08-21 1981-04-03 Siemens Ag Fixing of target material

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5633476A (en) * 1979-08-21 1981-04-03 Siemens Ag Fixing of target material

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02267261A (ja) * 1989-04-06 1990-11-01 Kojundo Chem Lab Co Ltd スパッタリングターゲットの製造方法
JP5026611B1 (ja) * 2011-09-21 2012-09-12 Ｊｘ日鉱日石金属株式会社 積層構造体及びその製造方法
KR101271846B1 (ko) * 2011-09-21 2013-06-07 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 적층 구조체 및 그 제조 방법

Also Published As

Publication number Publication date
JPH0368947B2 (enrdf_load_stackoverflow) 1991-10-30

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Legal Events

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