JPS61224342A - Ｌｓｉ配線修正方法及びその装置 - Google Patents

Ｌｓｉ配線修正方法及びその装置

Info

Publication number
JPS61224342A
JPS61224342A JP60063502A JP6350285A JPS61224342A JP S61224342 A JPS61224342 A JP S61224342A JP 60063502 A JP60063502 A JP 60063502A JP 6350285 A JP6350285 A JP 6350285A JP S61224342 A JPS61224342 A JP S61224342A
Authority
JP
Japan
Prior art keywords
wiring
laser beam
gas
lsi
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60063502A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0573052B2 (enrdf_load_stackoverflow
Inventor
Kuniyuki Fukuzawa
福沢　邦之
Mikio Hongo
幹雄 本郷
Takeoki Miyauchi
宮内　建興
Junzo Azuma
淳三 東
Katsuro Mizukoshi
克郎 水越
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60063502A priority Critical patent/JPS61224342A/ja
Publication of JPS61224342A publication Critical patent/JPS61224342A/ja
Publication of JPH0573052B2 publication Critical patent/JPH0573052B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
JP60063502A 1985-03-29 1985-03-29 Ｌｓｉ配線修正方法及びその装置 Granted JPS61224342A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60063502A JPS61224342A (ja) 1985-03-29 1985-03-29 Ｌｓｉ配線修正方法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60063502A JPS61224342A (ja) 1985-03-29 1985-03-29 Ｌｓｉ配線修正方法及びその装置

Publications (2)

Publication Number Publication Date
JPS61224342A true JPS61224342A (ja) 1986-10-06
JPH0573052B2 JPH0573052B2 (enrdf_load_stackoverflow) 1993-10-13

Family

ID=13231069

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60063502A Granted JPS61224342A (ja) 1985-03-29 1985-03-29 Ｌｓｉ配線修正方法及びその装置

Country Status (1)

Country Link
JP (1) JPS61224342A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63152150A (ja) * 1986-12-17 1988-06-24 Hitachi Ltd 多層配線の接続配線構造の形成方法
JPS63157438A (ja) * 1986-12-22 1988-06-30 Hitachi Ltd Ｉｃ素子並びにｉｃ素子における配線接続方法
JPS63278348A (ja) * 1987-05-11 1988-11-16 Hitachi Ltd Ｉｃ配線の接続方法及びその装置
JPS63287032A (ja) * 1987-05-20 1988-11-24 Hitachi Ltd 処理方法及び半導体装置の配線修正方法
JPH03253058A (ja) * 1990-03-01 1991-11-12 Hitachi Ltd 半導体集積回路の補修方式および半導体集積回路補修システム

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63152150A (ja) * 1986-12-17 1988-06-24 Hitachi Ltd 多層配線の接続配線構造の形成方法
JPS63157438A (ja) * 1986-12-22 1988-06-30 Hitachi Ltd Ｉｃ素子並びにｉｃ素子における配線接続方法
JPS63278348A (ja) * 1987-05-11 1988-11-16 Hitachi Ltd Ｉｃ配線の接続方法及びその装置
JPS63287032A (ja) * 1987-05-20 1988-11-24 Hitachi Ltd 処理方法及び半導体装置の配線修正方法
JPH03253058A (ja) * 1990-03-01 1991-11-12 Hitachi Ltd 半導体集積回路の補修方式および半導体集積回路補修システム

Also Published As

Publication number Publication date
JPH0573052B2 (enrdf_load_stackoverflow) 1993-10-13

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