JPS61216324A - 縮小投影式露光装置 - Google Patents

縮小投影式露光装置

Info

Publication number
JPS61216324A
JPS61216324A JP60057218A JP5721885A JPS61216324A JP S61216324 A JPS61216324 A JP S61216324A JP 60057218 A JP60057218 A JP 60057218A JP 5721885 A JP5721885 A JP 5721885A JP S61216324 A JPS61216324 A JP S61216324A
Authority
JP
Japan
Prior art keywords
exposure
mask
light quantity
exposure light
control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60057218A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0548610B2 (enrdf_load_stackoverflow
Inventor
Hiromi Yamashita
裕己 山下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP60057218A priority Critical patent/JPS61216324A/ja
Publication of JPS61216324A publication Critical patent/JPS61216324A/ja
Publication of JPH0548610B2 publication Critical patent/JPH0548610B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60057218A 1985-03-20 1985-03-20 縮小投影式露光装置 Granted JPS61216324A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60057218A JPS61216324A (ja) 1985-03-20 1985-03-20 縮小投影式露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60057218A JPS61216324A (ja) 1985-03-20 1985-03-20 縮小投影式露光装置

Publications (2)

Publication Number Publication Date
JPS61216324A true JPS61216324A (ja) 1986-09-26
JPH0548610B2 JPH0548610B2 (enrdf_load_stackoverflow) 1993-07-22

Family

ID=13049387

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60057218A Granted JPS61216324A (ja) 1985-03-20 1985-03-20 縮小投影式露光装置

Country Status (1)

Country Link
JP (1) JPS61216324A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01305518A (ja) * 1988-06-03 1989-12-08 Canon Inc 露光装置
US6734445B2 (en) * 2001-04-23 2004-05-11 Intel Corporation Mechanized retractable pellicles and methods of use

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5068066A (enrdf_load_stackoverflow) * 1973-10-17 1975-06-07
JPS57117238A (en) * 1981-01-14 1982-07-21 Nippon Kogaku Kk <Nikon> Exposing and baking device for manufacturing integrated circuit with illuminometer
JPS59149024A (ja) * 1983-02-16 1984-08-25 Hitachi Ltd 露光装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5068066A (enrdf_load_stackoverflow) * 1973-10-17 1975-06-07
JPS57117238A (en) * 1981-01-14 1982-07-21 Nippon Kogaku Kk <Nikon> Exposing and baking device for manufacturing integrated circuit with illuminometer
JPS59149024A (ja) * 1983-02-16 1984-08-25 Hitachi Ltd 露光装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01305518A (ja) * 1988-06-03 1989-12-08 Canon Inc 露光装置
US6734445B2 (en) * 2001-04-23 2004-05-11 Intel Corporation Mechanized retractable pellicles and methods of use
US7102127B2 (en) 2001-04-23 2006-09-05 Intel Corporation Mechanized retractable pellicles and methods of use

Also Published As

Publication number Publication date
JPH0548610B2 (enrdf_load_stackoverflow) 1993-07-22

Similar Documents

Publication Publication Date Title
US5521033A (en) Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process
US5614990A (en) Illumination tailoring system using photochromic filter
KR20020022117A (ko) 노광장치 및 노광방법
US4583840A (en) Exposure apparatus
JPS61216324A (ja) 縮小投影式露光装置
JPS5990929A (ja) 投影露光装置のピント合わせ方法
JPH0669015B2 (ja) 投影露光装置
JP2008139761A (ja) 露光方法および露光装置
JPH0225016A (ja) 露光装置
JPS6035516A (ja) 露光方法及び装置
KR100330966B1 (ko) 반도체 웨이퍼 노광 시스템
JPH0272365A (ja) 写真処理装置
KR20040079493A (ko) 노광장치 및 노광처리 방법
JPS6078455A (ja) 露光装置
JPS56146138A (en) Method and apparatus for exposing photomask
JPS56132326A (en) Exposure method and exposure device
JPH0864510A (ja) 露光量制御方法及びその装置
JPH0883761A (ja) 投影露光装置
JPS6329930A (ja) 縮小投影露光装置
JPS63132427A (ja) 露光装置
JPS6012732A (ja) 露光装置
JPH0458245A (ja) 微細パターン形成用マスク及びその製造方法
JPH01158727A (ja) 縮小投影型露光装置
JPH09199405A (ja) 露光方法及びその装置
JP2011198990A (ja) 投影露光装置の迷光を測定する測定方法、投影露光装置の露光方法、および投影露光装置の保守方法