JPS61205155U - - Google Patents

Info

Publication number
JPS61205155U
JPS61205155U JP8992185U JP8992185U JPS61205155U JP S61205155 U JPS61205155 U JP S61205155U JP 8992185 U JP8992185 U JP 8992185U JP 8992185 U JP8992185 U JP 8992185U JP S61205155 U JPS61205155 U JP S61205155U
Authority
JP
Japan
Prior art keywords
lead
piezo
pressure sensor
semiconductor substrate
resistance layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8992185U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8992185U priority Critical patent/JPS61205155U/ja
Publication of JPS61205155U publication Critical patent/JPS61205155U/ja
Pending legal-status Critical Current

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  • Measuring Fluid Pressure (AREA)
  • Pressure Sensors (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例の要部構成説明図、
第2図は第1図の平面図、第3図は第1図の工程
図、第4図は本考案の他の実施例の構成説明図、
第5図は第4図の平面図、第6図は本考案の別の
実施例の構成説明図で、第7図は第6図の平面図
、第8図は第6図の動作説明図、第9図、第10
図、第11図、第12図は従来より一般に使用さ
れている従来例の構成説明図で、第9図は側断面
図、第10図は平面図、第11図は要部詳細説明
図、第12図は動作説明図である。 1……支持台、2……ダイアフラム、21……
基準室、3……剪断形ゲージ、31……パシベー
シヨン膜、311……酸化シリコン膜、312…
…窒化膜、32……リード、33……電極、34
……応力緩衝層、35……導電体部。
FIG. 1 is an explanatory diagram of the main part of an embodiment of the present invention.
FIG. 2 is a plan view of FIG. 1, FIG. 3 is a process diagram of FIG. 1, and FIG. 4 is a structural explanatory diagram of another embodiment of the present invention.
5 is a plan view of FIG. 4, FIG. 6 is an explanatory diagram of the configuration of another embodiment of the present invention, FIG. 7 is a plan view of FIG. 6, and FIG. 8 is an explanatory diagram of the operation of FIG. 6. , Figure 9, Figure 10
11 and 12 are explanatory diagrams of the configuration of a conventional example that has been generally used in the past, where FIG. 9 is a side sectional view, FIG. 10 is a plan view, and FIG. FIG. 12 is an explanatory diagram of the operation. 1...Support stand, 2...Diaphragm, 21...
Reference chamber, 3... Shear type gauge, 31... Passivation film, 311... Silicon oxide film, 312...
...Nitride film, 32...Lead, 33...Electrode, 34
... Stress buffer layer, 35 ... Conductor part.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] シリコン半導体基板表面部分にピエゾ抵抗素子
とピエゾ抵抗素子のリード取出し抵抗層が形成さ
れシリコン半導体基板表面がパシベーシヨン膜で
覆われている半導体圧力センサにおいて、前記ピ
エゾ抵抗素子と前記リード取出し抵抗層の外表面
が平坦な平面に構成されたことを特徴とする半導
体圧力センサ。
In a semiconductor pressure sensor in which a piezoresistive element and a lead-out resistance layer of the piezo-resistance element are formed on a surface portion of a silicon semiconductor substrate, and the silicon semiconductor substrate surface is covered with a passivation film, the outside of the piezo-resistance element and the lead-out resistance layer is A semiconductor pressure sensor characterized by having a flat surface.
JP8992185U 1985-06-14 1985-06-14 Pending JPS61205155U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8992185U JPS61205155U (en) 1985-06-14 1985-06-14

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8992185U JPS61205155U (en) 1985-06-14 1985-06-14

Publications (1)

Publication Number Publication Date
JPS61205155U true JPS61205155U (en) 1986-12-24

Family

ID=30644454

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8992185U Pending JPS61205155U (en) 1985-06-14 1985-06-14

Country Status (1)

Country Link
JP (1) JPS61205155U (en)

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