JPS61194827A - 拡散保護膜形成方法 - Google Patents

拡散保護膜形成方法

Info

Publication number
JPS61194827A
JPS61194827A JP60035992A JP3599285A JPS61194827A JP S61194827 A JPS61194827 A JP S61194827A JP 60035992 A JP60035992 A JP 60035992A JP 3599285 A JP3599285 A JP 3599285A JP S61194827 A JPS61194827 A JP S61194827A
Authority
JP
Japan
Prior art keywords
silicon nitride
film
diffusion
layer
monosilane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60035992A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0147003B2 (enExample
Inventor
Akihiro Hashimoto
明弘 橋本
Masao Kobayashi
正男 小林
Takeshi Kamijo
健 上條
Takeshi Takamori
高森　毅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP60035992A priority Critical patent/JPS61194827A/ja
Publication of JPS61194827A publication Critical patent/JPS61194827A/ja
Publication of JPH0147003B2 publication Critical patent/JPH0147003B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P32/00—

Landscapes

  • Led Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP60035992A 1985-02-25 1985-02-25 拡散保護膜形成方法 Granted JPS61194827A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60035992A JPS61194827A (ja) 1985-02-25 1985-02-25 拡散保護膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60035992A JPS61194827A (ja) 1985-02-25 1985-02-25 拡散保護膜形成方法

Publications (2)

Publication Number Publication Date
JPS61194827A true JPS61194827A (ja) 1986-08-29
JPH0147003B2 JPH0147003B2 (enExample) 1989-10-12

Family

ID=12457325

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60035992A Granted JPS61194827A (ja) 1985-02-25 1985-02-25 拡散保護膜形成方法

Country Status (1)

Country Link
JP (1) JPS61194827A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6449234A (en) * 1987-08-20 1989-02-23 Nec Corp Semiconductor device
JP2015128174A (ja) * 2002-05-17 2015-07-09 株式会社半導体エネルギー研究所 半導体装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6449234A (en) * 1987-08-20 1989-02-23 Nec Corp Semiconductor device
JP2015128174A (ja) * 2002-05-17 2015-07-09 株式会社半導体エネルギー研究所 半導体装置
US9847355B2 (en) 2002-05-17 2017-12-19 Semiconductor Energy Laboratory Co., Ltd. Silicon nitride film, and semiconductor device

Also Published As

Publication number Publication date
JPH0147003B2 (enExample) 1989-10-12

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term