JPS61186158U - - Google Patents
Info
- Publication number
- JPS61186158U JPS61186158U JP6907885U JP6907885U JPS61186158U JP S61186158 U JPS61186158 U JP S61186158U JP 6907885 U JP6907885 U JP 6907885U JP 6907885 U JP6907885 U JP 6907885U JP S61186158 U JPS61186158 U JP S61186158U
- Authority
- JP
- Japan
- Prior art keywords
- objective
- sample
- aperture
- electron gun
- objective lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 claims 1
- 238000005086 pumping Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Description
第1図は本考案の一実施例の構成図、第2図は
従来装置の構成図である。
1:電子銃、2:コンデンサーレンズ、3:対
物絞り、4:走査コイル、5:対物レンズ、6:
試料、8:反射電子検出器、9:差動排気絞り、
A:対物レンズ主面。
FIG. 1 is a block diagram of an embodiment of the present invention, and FIG. 2 is a block diagram of a conventional device. 1: Electron gun, 2: Condenser lens, 3: Objective aperture, 4: Scanning coil, 5: Objective lens, 6:
Sample, 8: Backscattered electron detector, 9: Differential exhaust aperture,
A: Main surface of objective lens.
Claims (1)
ンデンサーレンズと、該コンデンサーレンズの下
方に設けられた対物レンズと、該対物レンズに入
射する電子線の開き角を制限する対物絞りと、該
対物絞りと対物レンズの間に設けられた走査手段
と、差動排気絞りとを備え、該電子銃側と試料側
を差動排気すると共に試料表面に活性ガスを導入
して試料の表面反応を測定する装置において、前
記差動排気絞りを対物絞りの近傍に設けたことを
特徴とするオージエ電子分光装置。 a condenser lens provided on the electron gun side between the electron gun and the sample, an objective lens provided below the condenser lens, and an objective aperture that limits the aperture angle of the electron beam incident on the objective lens; It includes a scanning means provided between the objective diaphragm and the objective lens, and a differential exhaust diaphragm, which differentially evacuates the electron gun side and the sample side, and introduces an active gas to the sample surface to react on the surface of the sample. 1. An Auger electron spectrometer, characterized in that the differential pumping aperture is provided in the vicinity of an objective aperture.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6907885U JPH0511643Y2 (en) | 1985-05-10 | 1985-05-10 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6907885U JPH0511643Y2 (en) | 1985-05-10 | 1985-05-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61186158U true JPS61186158U (en) | 1986-11-20 |
JPH0511643Y2 JPH0511643Y2 (en) | 1993-03-23 |
Family
ID=30604416
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6907885U Expired - Lifetime JPH0511643Y2 (en) | 1985-05-10 | 1985-05-10 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0511643Y2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013179808A1 (en) * | 2012-05-31 | 2013-12-05 | 株式会社 日立ハイテクノロジーズ | Charged particle device |
-
1985
- 1985-05-10 JP JP6907885U patent/JPH0511643Y2/ja not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013179808A1 (en) * | 2012-05-31 | 2013-12-05 | 株式会社 日立ハイテクノロジーズ | Charged particle device |
JP2013251088A (en) * | 2012-05-31 | 2013-12-12 | Hitachi High-Technologies Corp | Charged particle device |
CN104350575A (en) * | 2012-05-31 | 2015-02-11 | 株式会社日立高新技术 | Charged particle device |
Also Published As
Publication number | Publication date |
---|---|
JPH0511643Y2 (en) | 1993-03-23 |
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