JPH0511643Y2 - - Google Patents

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an Auger electron spectroscopy device that makes it possible to analyze electron channeling patterns by angular scanning of an electron beam.

[Prior Art] In an Auger electron spectrometer, when measuring a surface reaction of a sample, for example, oxygen gas is introduced to the surface of the sample. A problem when introducing such active gases is that the filament of the electron gun becomes unstable due to the influence of these gases. Therefore, in such an apparatus, the exhaust system on the electron gun side is often independent of the exhaust system on the sample chamber side, so that so-called differential pumping is performed. Second
The figure shows such a conventional device. In the figure, 1 is an electron gun, and the electron beam EB from the electron gun 1 is focused by a condenser lens 2, passes through an objective aperture 3, and enters a deflection system. incident. Objective aperture 3
is for limiting the aperture angle of the electron beam EB incident on the objective lens, which will be described later. 4 is a scanning coil as a deflection system, and the electron beam EB deflected by the scanning coil 4 is irradiated onto a sample 6 through an objective lens 5. Reference numeral 7 denotes a differential exhaust aperture located at the main surface A of the objective lens 5. By arranging the differential exhaust aperture 7, differential exhaust between the electron gun side and the sample chamber side becomes possible. 8 is a backscattered electron detector for detecting, for example, backscattered electrons emitted from the sample when the sample is irradiated with the electron beam EB.

[Problems to be solved by the invention] By the way, in the conventional apparatus configured as described above, in order to obtain an electron channeling pattern, the incident point P of the electron beam EB on the sample 6 is fixed, and the electron beam EB is For example, 2 of X and Y
When attempting to perform angle scanning by sequentially scanning in the direction, since the differential exhaust aperture 7 is arranged on the main surface A of the objective lens 5, the maximum value of the electron beam incident angle is determined by the differential exhaust aperture 7. There was a drawback that θ was limited and a satisfactory electron channeling pattern could not be obtained.

The present invention was developed in view of the above points, and an object thereof is to provide an Auger electron spectrometer that eliminates the limitation of angle scanning of an electron beam due to a differential exhaust aperture and makes it possible to obtain an electron channeling pattern. It is said that

[Means for Solving the Problems] The configuration of the present invention for achieving the above object includes a condenser lens provided on the electron gun side between the electron gun and the sample, and a condenser lens provided below the condenser lens. an objective lens, an objective aperture that limits the aperture angle of an electron beam incident on the objective lens, and a scanning means provided between the objective aperture and the objective lens;
In an apparatus that measures the surface reaction of a sample by differentially pumping the electron gun side and the sample side and introducing an active gas to the sample surface, the differential pumping aperture is located near the objective aperture. It is characterized by the fact that it is set in

[Example] An example of the present invention will be described below in detail based on the accompanying drawings.

FIG. 1 is a block diagram of one embodiment of the present invention, and the same components as those of the conventional device shown in FIG. 2 are given the same numbers and their explanations will be omitted. Here, the difference between the embodiment apparatus shown in FIG. 1 and the conventional apparatus shown in FIG. It is located at the point placed in .

With this configuration, when the electron beam EB is sequentially angularly scanned in two directions, the X direction and the Y direction, the differential exhaust diaphragm 9 is not placed at the position of the objective lens 5 where the amplitude is maximum. Therefore, the conventional limitation is eliminated, and the maximum value θ of the electron beam incident angle at the incident point P can be made sufficiently large. Therefore, by detecting backscattered electrons from the sample 6 during angular scanning with a backscattered electron detector 8 and supplying this detection signal to a display means (not shown) synchronized with the scanning, the electron channeling pattern can be seen. can be displayed. At this time, since the position of the differential exhaust aperture 9 moved to the vicinity of the objective aperture 3,
Oxygen gas still exists in the upper part than in the past, but the action of the differential exhaust throttle 9 restricts its entry into the electron gun side, so that it does not destabilize the filament. Further, since the differential exhaust aperture 9 is arranged near the objective aperture 3, which is one of the positions where the electron beam flux is the narrowest, the hole diameter of the differential exhaust aperture 9 can also be made smaller than in the past. Therefore, differential pumping characteristics can also be improved.

[Effects of the invention] As is clear from the above explanation, according to the invention, the electron beam can be scanned at a sufficiently large angle without being restricted by the differential exhaust aperture, making it possible to obtain an electron channeling pattern. An Augier electron spectroscopy device is provided.

[Brief explanation of the drawing]

FIG. 1 is a block diagram of an embodiment of the present invention, and FIG. 2 is a block diagram of a conventional device. 1...Electron gun, 2...Condenser lens, 3
...Objective aperture, 4...Scanning coil, 5...Objective lens, 6...Sample, 8...Backscattered electron detector, 9...
...Differential exhaust aperture, A...Main surface of objective lens.

Claims (1)

[Scope of utility model registration request] a condenser lens provided on the electron gun side between the electron gun and the sample, an objective lens provided below the condenser lens, and an objective aperture that limits the aperture angle of the electron beam incident on the objective lens; It includes a scanning means provided between the objective diaphragm and the objective lens, and a differential exhaust diaphragm, which differentially evacuates the electron gun side and the sample side, and introduces an active gas to the sample surface to react on the surface of the sample. 1. An Auger electron spectrometer, characterized in that the differential pumping aperture is provided in the vicinity of an objective aperture.