JPH01165627U - - Google Patents
Info
- Publication number
- JPH01165627U JPH01165627U JP6232488U JP6232488U JPH01165627U JP H01165627 U JPH01165627 U JP H01165627U JP 6232488 U JP6232488 U JP 6232488U JP 6232488 U JP6232488 U JP 6232488U JP H01165627 U JPH01165627 U JP H01165627U
- Authority
- JP
- Japan
- Prior art keywords
- ion
- ion current
- etching apparatus
- generation chamber
- beam etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 claims description 2
- 238000010884 ion-beam technique Methods 0.000 claims description 2
- 238000000605 extraction Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案の一実施例の反応性イオンビー
ムエツチング装置の断面図、第２図は従来の装置
の断面図、第３図は本考案に基づくイオン電流絞
り筒の長さの被エツチング試料へのイオン電流と
の関係を示す線図である。
１：イオン発生室、２：試料室、３：排気管、
４：マイクロ波源、５：ガス導入管、６：集束コ
イル、７：プラズマ電位調節用電極、８：被エツ
チング試料、９：イオン電流絞り筒。
Fig. 1 is a cross-sectional view of a reactive ion beam etching apparatus according to an embodiment of the present invention, Fig. 2 is a cross-sectional view of a conventional apparatus, and Fig. 3 is a diagram showing the length of the ion current aperture tube to be etched based on the present invention. FIG. 3 is a diagram showing the relationship between the ion current and the sample. 1: Ion generation chamber, 2: Sample chamber, 3: Exhaust pipe,
4: microwave source, 5: gas introduction tube, 6: focusing coil, 7: plasma potential adjustment electrode, 8: sample to be etched, 9: ion current restrictor tube.
Claims (1)
のイオン引き出し口の周囲にイオン電流方向に平
行な絶縁性イオン電流絞り筒が連結されたことを
特徴とする反応性イオンビームエツチング装置。 A reactive ion beam etching apparatus characterized in that an insulating ion current restrictor parallel to the ion current direction is connected around an ion extraction port of an ion generation chamber equipped with a plasma potential adjustment electrode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6232488U JPH01165627U (en) | 1988-05-12 | 1988-05-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6232488U JPH01165627U (en) | 1988-05-12 | 1988-05-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01165627U true JPH01165627U (en) | 1989-11-20 |
Family
ID=31287947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6232488U Pending JPH01165627U (en) | 1988-05-12 | 1988-05-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01165627U (en) |
-
1988
- 1988-05-12 JP JP6232488U patent/JPH01165627U/ja active Pending
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