JPH028853U - - Google Patents
Info
- Publication number
- JPH028853U JPH028853U JP8788288U JP8788288U JPH028853U JP H028853 U JPH028853 U JP H028853U JP 8788288 U JP8788288 U JP 8788288U JP 8788288 U JP8788288 U JP 8788288U JP H028853 U JPH028853 U JP H028853U
- Authority
- JP
- Japan
- Prior art keywords
- inductively coupled
- coupled plasma
- frequency inductively
- nozzle
- mass spectrometer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003989 dielectric material Substances 0.000 claims description 2
- 238000009616 inductively coupled plasma Methods 0.000 claims 3
- 150000002500 ions Chemical class 0.000 claims 3
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000006199 nebulizer Substances 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
- Electron Tubes For Measurement (AREA)
Description
第１図は本考案の一実施例を示す要部拡大断面
図、第２図はＩＣＰ―ＭＳの構成を示す図である
。
１：ＩＣＰイオン源、２：高周波コイル、３：
プラズマトーチ、４：ネブライザ、５：試料ボト
ル、６：試料液、７：導入管、８：インターフエ
ース、９：ノズル、１０，１１：第１，第２のス
キマー、１２：質量分析装置、１４：油拡散ポン
プ、１５，１６：油回転ポンプ、１７：電極群、
１８：ケース、１９：加速電極、２０：電気絶縁
体、２１：支持枠。
FIG. 1 is an enlarged sectional view of a main part showing an embodiment of the present invention, and FIG. 2 is a diagram showing the configuration of an ICP-MS. 1: ICP ion source, 2: High frequency coil, 3:
Plasma torch, 4: Nebulizer, 5: Sample bottle, 6: Sample liquid, 7: Introduction tube, 8: Interface, 9: Nozzle, 10, 11: First and second skimmer, 12: Mass spectrometer, 14 : oil diffusion pump, 15, 16: oil rotary pump, 17: electrode group,
18: case, 19: accelerating electrode, 20: electric insulator, 21: support frame.
Claims (1)
をイオン化し、生じたイオンをノズル及びスキマ
ーからなるインターフエースを介して質量分析計
に導入するようにした装置において、前記高周波
誘導結合プラズマイオン源を電気良導体製ケース
で包囲し、かつこのケースの前記ノズルと対向す
る表面を電気絶縁体で覆うようにしたことを特徴
とする高周波誘導結合プラズマ質量分析装置。 In an apparatus in which a sample is ionized using a high frequency inductively coupled plasma ion source and the generated ions are introduced into a mass spectrometer via an interface consisting of a nozzle and a skimmer, the high frequency inductively coupled plasma ion source is 1. A high-frequency inductively coupled plasma mass spectrometer, characterized in that the device is surrounded by a manufactured case, and the surface of the case facing the nozzle is covered with an electric insulator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8788288U JPH0521245Y2 (en) | 1988-07-01 | 1988-07-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8788288U JPH0521245Y2 (en) | 1988-07-01 | 1988-07-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH028853U true JPH028853U (en) | 1990-01-19 |
| JPH0521245Y2 JPH0521245Y2 (en) | 1993-05-31 |
Family
ID=31312472
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8788288U Expired - Lifetime JPH0521245Y2 (en) | 1988-07-01 | 1988-07-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0521245Y2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07246919A (en) * | 1994-03-10 | 1995-09-26 | Kawasaki Heavy Ind Ltd | Bus floor reverse cleaning system |
| JP2010197080A (en) * | 2009-02-23 | 2010-09-09 | Sii Nanotechnology Inc | Induction coupling plasma analyzer |
-
1988
- 1988-07-01 JP JP8788288U patent/JPH0521245Y2/ja not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07246919A (en) * | 1994-03-10 | 1995-09-26 | Kawasaki Heavy Ind Ltd | Bus floor reverse cleaning system |
| JP2010197080A (en) * | 2009-02-23 | 2010-09-09 | Sii Nanotechnology Inc | Induction coupling plasma analyzer |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0521245Y2 (en) | 1993-05-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH028853U (en) | ||
| JP2603722B2 (en) | High frequency inductively coupled plasma mass spectrometer | |
| JPH028854U (en) | ||
| JP2591822B2 (en) | High frequency inductively coupled plasma mass spectrometer | |
| JP3471821B2 (en) | High frequency inductively coupled plasma analyzer | |
| JP2000067806A (en) | Atmospheric pressure ion source | |
| JPH0215553A (en) | High frequency induction combining plasma mass spectrometry device | |
| JPH03100353U (en) | ||
| JP2568132Y2 (en) | Exhaust device in high frequency inductively coupled plasma mass spectrometer | |
| JPS6356557U (en) | ||
| JPH0279551U (en) | ||
| JPH0176033U (en) | ||
| JPH01100362U (en) | ||
| JPH0241400U (en) | ||
| JPH04262356A (en) | High frequency induction coupled plasma mass-spectrometric device | |
| JPH0345633U (en) | ||
| JPS62109448U (en) | ||
| JPH038429U (en) | ||
| JPH0379422U (en) | ||
| JPH06111760A (en) | Skimmer cone of induction coupling plasma mass-spectrometer | |
| JPH0379421U (en) | ||
| JPH01158640U (en) | ||
| JPH0577261U (en) | Dry etching equipment | |
| JPH01165625U (en) | ||
| JPS63153525U (en) |