JPS61183460A - 銅被着プラスチツクフイルムの製造方法 - Google Patents
銅被着プラスチツクフイルムの製造方法Info
- Publication number
- JPS61183460A JPS61183460A JP60023780A JP2378085A JPS61183460A JP S61183460 A JPS61183460 A JP S61183460A JP 60023780 A JP60023780 A JP 60023780A JP 2378085 A JP2378085 A JP 2378085A JP S61183460 A JPS61183460 A JP S61183460A
- Authority
- JP
- Japan
- Prior art keywords
- plastic film
- copper
- film
- production
- ion plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Non-Insulated Conductors (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60023780A JPS61183460A (ja) | 1985-02-08 | 1985-02-08 | 銅被着プラスチツクフイルムの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60023780A JPS61183460A (ja) | 1985-02-08 | 1985-02-08 | 銅被着プラスチツクフイルムの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61183460A true JPS61183460A (ja) | 1986-08-16 |
| JPH0424427B2 JPH0424427B2 (enExample) | 1992-04-27 |
Family
ID=12119838
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60023780A Granted JPS61183460A (ja) | 1985-02-08 | 1985-02-08 | 銅被着プラスチツクフイルムの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61183460A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6350464A (ja) * | 1986-08-19 | 1988-03-03 | Toobi:Kk | シ−トプラズマ・イオンプレ−テイング方法とその装置 |
| US5384238A (en) * | 1991-10-14 | 1995-01-24 | Minnesota Mining And Manufacturing Company | Positive-acting photothermographic materials |
-
1985
- 1985-02-08 JP JP60023780A patent/JPS61183460A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6350464A (ja) * | 1986-08-19 | 1988-03-03 | Toobi:Kk | シ−トプラズマ・イオンプレ−テイング方法とその装置 |
| US5384238A (en) * | 1991-10-14 | 1995-01-24 | Minnesota Mining And Manufacturing Company | Positive-acting photothermographic materials |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0424427B2 (enExample) | 1992-04-27 |
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