JPS61167948A - ポジ型感光性組成物用現像液 - Google Patents

ポジ型感光性組成物用現像液

Info

Publication number
JPS61167948A
JPS61167948A JP60008731A JP873185A JPS61167948A JP S61167948 A JPS61167948 A JP S61167948A JP 60008731 A JP60008731 A JP 60008731A JP 873185 A JP873185 A JP 873185A JP S61167948 A JPS61167948 A JP S61167948A
Authority
JP
Japan
Prior art keywords
cresol
developer
polyoxyethylene
ether
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60008731A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0562735B2 (OSRAM
Inventor
Konoe Miura
三浦　近衛
Tameichi Ochiai
落合　為一
Yasuhiro Kameyama
泰弘 亀山
Chie Tanaka
千絵 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Priority to JP60008731A priority Critical patent/JPS61167948A/ja
Publication of JPS61167948A publication Critical patent/JPS61167948A/ja
Publication of JPH0562735B2 publication Critical patent/JPH0562735B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/18—Diazo-type processes, e.g. thermal development, or agents therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60008731A 1985-01-21 1985-01-21 ポジ型感光性組成物用現像液 Granted JPS61167948A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60008731A JPS61167948A (ja) 1985-01-21 1985-01-21 ポジ型感光性組成物用現像液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60008731A JPS61167948A (ja) 1985-01-21 1985-01-21 ポジ型感光性組成物用現像液

Publications (2)

Publication Number Publication Date
JPS61167948A true JPS61167948A (ja) 1986-07-29
JPH0562735B2 JPH0562735B2 (OSRAM) 1993-09-09

Family

ID=11701096

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60008731A Granted JPS61167948A (ja) 1985-01-21 1985-01-21 ポジ型感光性組成物用現像液

Country Status (1)

Country Link
JP (1) JPS61167948A (OSRAM)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61185745A (ja) * 1985-02-14 1986-08-19 Toshiba Corp ポジ型フオトレジスト現像液組成物
JPS62270951A (ja) * 1986-05-19 1987-11-25 Sumitomo Chem Co Ltd ポジ型フォトレジスト用クレゾールノボラック樹脂
JPS6472155A (en) * 1987-09-12 1989-03-17 Tama Kagaku Kogyo Kk Developing solution for positive type photoresist
JPH01129250A (ja) * 1987-11-16 1989-05-22 Tama Kagaku Kogyo Kk ポジ型フォトレジスト用現像液
JPH01257846A (ja) * 1988-04-07 1989-10-13 Fuji Photo Film Co Ltd ポジ型フオトレジスト用現像液
US5238771A (en) * 1988-05-31 1993-08-24 Konica Corporation Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive
US5543268A (en) * 1992-05-14 1996-08-06 Tokyo Ohka Kogyo Co., Ltd. Developer solution for actinic ray-sensitive resist
WO1999000707A1 (fr) * 1997-06-27 1999-01-07 Clariant International Ltd. Revelateur pour agents de reserve

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3586504A (en) * 1969-10-24 1971-06-22 Eastman Kodak Co Photoresist developers and methods
JPS589143A (ja) * 1981-04-10 1983-01-19 シツプレ−・カンパニ−・インコ−ポレ−テツド 金属イオンを含まないフオ−トレジスト現像液組成物
JPS59182444A (ja) * 1983-04-01 1984-10-17 Sumitomo Chem Co Ltd ポジ型フオトレジストの改良現像液
JPS6118944A (ja) * 1984-05-16 1986-01-27 アライド・コ−ポレ−シヨン 低金属イオンホトレジスト現像液

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3586504A (en) * 1969-10-24 1971-06-22 Eastman Kodak Co Photoresist developers and methods
JPS589143A (ja) * 1981-04-10 1983-01-19 シツプレ−・カンパニ−・インコ−ポレ−テツド 金属イオンを含まないフオ−トレジスト現像液組成物
JPS59182444A (ja) * 1983-04-01 1984-10-17 Sumitomo Chem Co Ltd ポジ型フオトレジストの改良現像液
JPS6118944A (ja) * 1984-05-16 1986-01-27 アライド・コ−ポレ−シヨン 低金属イオンホトレジスト現像液

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61185745A (ja) * 1985-02-14 1986-08-19 Toshiba Corp ポジ型フオトレジスト現像液組成物
JPS62270951A (ja) * 1986-05-19 1987-11-25 Sumitomo Chem Co Ltd ポジ型フォトレジスト用クレゾールノボラック樹脂
JPS6472155A (en) * 1987-09-12 1989-03-17 Tama Kagaku Kogyo Kk Developing solution for positive type photoresist
JPH01129250A (ja) * 1987-11-16 1989-05-22 Tama Kagaku Kogyo Kk ポジ型フォトレジスト用現像液
JPH01257846A (ja) * 1988-04-07 1989-10-13 Fuji Photo Film Co Ltd ポジ型フオトレジスト用現像液
US5238771A (en) * 1988-05-31 1993-08-24 Konica Corporation Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive
US5543268A (en) * 1992-05-14 1996-08-06 Tokyo Ohka Kogyo Co., Ltd. Developer solution for actinic ray-sensitive resist
WO1999000707A1 (fr) * 1997-06-27 1999-01-07 Clariant International Ltd. Revelateur pour agents de reserve

Also Published As

Publication number Publication date
JPH0562735B2 (OSRAM) 1993-09-09

Similar Documents

Publication Publication Date Title
US5106724A (en) Developer for light-sensitive lithographic printing plate capable of processing commonly the negative-type and the positive-type and developer composition for light-sensitive material
JP3968177B2 (ja) 微細レジストパターン形成方法
EP0851305B1 (en) Rinsing and stripping process for lithography
EP0800664B1 (en) Metal ion reduction in novolak resin using an ion exchange resin in a polar solvent and photoresists compositions therefrom
JPH05234878A (ja) レジスト成分からの不純物の除去方法
JPH0654388B2 (ja) ポジ型ホトレジスト組成物
CN1171799A (zh) 降低在pgmea中的酚醛清漆树脂溶液的金属离子含量
JPS61167948A (ja) ポジ型感光性組成物用現像液
US5030550A (en) Developer for positive type photoresists
JP2771076B2 (ja) レジスト成分からの金属不純物の除去方法
US5446126A (en) Method for removing metal impurities from resist components
JPH0656487B2 (ja) ポジ型ホトレジスト用組成物
JPH0451019B2 (OSRAM)
JP2787943B2 (ja) ポジ型フォトレジスト組成物
JPS63210923A (ja) パタ−ン形成用樹脂組成物
JPH0561195A (ja) ポジ型ホトレジスト組成物
JP2836916B2 (ja) ポジ型ホトレジスト組成物
JP2566045B2 (ja) 新規ポジ型感光性組成物
JPS60125841A (ja) ポジ型フオトレジスト組成物
JPH0348250A (ja) ポジ型レジスト組成物
JP2619050B2 (ja) ポジ型感光性組成物
JPH0219851A (ja) ポジ型フォトレジスト用現像液
JPH0247656A (ja) ポジ型フォトレジスト
JPH02109051A (ja) ポジ型フォトレジスト組成物
JP2624541B2 (ja) 新規なポジ型感光性組成物

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term