JPS61166027A - 縮小投影露光装置 - Google Patents

縮小投影露光装置

Info

Publication number
JPS61166027A
JPS61166027A JP60261110A JP26111085A JPS61166027A JP S61166027 A JPS61166027 A JP S61166027A JP 60261110 A JP60261110 A JP 60261110A JP 26111085 A JP26111085 A JP 26111085A JP S61166027 A JPS61166027 A JP S61166027A
Authority
JP
Japan
Prior art keywords
lens
pattern
reticle
reduction
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60261110A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6237529B2 (enExample
Inventor
Shinji Kuniyoshi
伸治 国吉
Akihiro Takanashi
高梨　明紘
Tsuneo Terasawa
恒男 寺澤
Toshishige Kurosaki
利栄 黒崎
Sumio Hosaka
純男 保坂
Yoshio Kawamura
河村　喜雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60261110A priority Critical patent/JPS61166027A/ja
Publication of JPS61166027A publication Critical patent/JPS61166027A/ja
Publication of JPS6237529B2 publication Critical patent/JPS6237529B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60261110A 1985-11-22 1985-11-22 縮小投影露光装置 Granted JPS61166027A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60261110A JPS61166027A (ja) 1985-11-22 1985-11-22 縮小投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60261110A JPS61166027A (ja) 1985-11-22 1985-11-22 縮小投影露光装置

Publications (2)

Publication Number Publication Date
JPS61166027A true JPS61166027A (ja) 1986-07-26
JPS6237529B2 JPS6237529B2 (enExample) 1987-08-13

Family

ID=17357223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60261110A Granted JPS61166027A (ja) 1985-11-22 1985-11-22 縮小投影露光装置

Country Status (1)

Country Link
JP (1) JPS61166027A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04136716U (ja) * 1991-06-12 1992-12-18 三菱農機株式会社 作業用走行車におけるアクセル機構の無人操作装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5570025A (en) * 1978-10-19 1980-05-27 Censor Patent Versuch Device for projecting and printing mark of mask on semiconductor substrate
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5570025A (en) * 1978-10-19 1980-05-27 Censor Patent Versuch Device for projecting and printing mark of mask on semiconductor substrate
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device

Also Published As

Publication number Publication date
JPS6237529B2 (enExample) 1987-08-13

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