JPS61163547A - Ｘ線取り出し窓 - Google Patents
Ｘ線取り出し窓Info
- Publication number
- JPS61163547A JPS61163547A JP450585A JP450585A JPS61163547A JP S61163547 A JPS61163547 A JP S61163547A JP 450585 A JP450585 A JP 450585A JP 450585 A JP450585 A JP 450585A JP S61163547 A JPS61163547 A JP S61163547A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- film
- chamber
- plasma
- ray extraction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010408 film Substances 0.000 claims description 70
- 238000000605 extraction Methods 0.000 claims description 56
- 239000012528 membrane Substances 0.000 claims description 34
- 238000002834 transmittance Methods 0.000 claims description 20
- 229910052710 silicon Inorganic materials 0.000 claims description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052790 beryllium Inorganic materials 0.000 claims description 7
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- -1 polypropylene Polymers 0.000 claims description 6
- 230000005855 radiation Effects 0.000 claims description 6
- 239000004642 Polyimide Substances 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 239000002131 composite material Substances 0.000 claims description 5
- 229920001721 polyimide Polymers 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims description 5
- 239000010936 titanium Substances 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 239000004743 Polypropylene Substances 0.000 claims description 4
- 229910007991 Si-N Inorganic materials 0.000 claims description 4
- 229910006294 Si—N Inorganic materials 0.000 claims description 4
- 229920001155 polypropylene Polymers 0.000 claims description 4
- 229920002799 BoPET Polymers 0.000 claims description 3
- 239000005041 Mylar™ Substances 0.000 claims description 3
- 239000000284 extract Substances 0.000 claims description 2
- 239000012779 reinforcing material Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 abstract description 32
- 230000007935 neutral effect Effects 0.000 abstract description 13
- 239000007789 gas Substances 0.000 description 53
- 229910052734 helium Inorganic materials 0.000 description 8
- 239000001307 helium Substances 0.000 description 8
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 8
- 238000004804 winding Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 5
- 230000005284 excitation Effects 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000001934 delay Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052754 neon Inorganic materials 0.000 description 2
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009528 severe injury Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/16—Vessels; Containers; Shields associated therewith
Landscapes
- Radiation-Therapy Devices (AREA)
- X-Ray Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP450585A JPS61163547A (ja) | 1985-01-14 | 1985-01-14 | Ｘ線取り出し窓 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP450585A JPS61163547A (ja) | 1985-01-14 | 1985-01-14 | Ｘ線取り出し窓 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61163547A true JPS61163547A (ja) | 1986-07-24 |
| JPH0372183B2 JPH0372183B2 (enrdf_load_stackoverflow) | 1991-11-15 |
Family
ID=11585907
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP450585A Granted JPS61163547A (ja) | 1985-01-14 | 1985-01-14 | Ｘ線取り出し窓 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61163547A (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02253598A (ja) * | 1989-03-27 | 1990-10-12 | Nichicon Corp | Ｘ線発生装置 |
| JP2008506238A (ja) * | 2004-07-09 | 2008-02-28 | エナジェティック・テクノロジー・インコーポレーテッド | 誘導駆動プラズマ光源 |
| JP2011019675A (ja) * | 2009-07-15 | 2011-02-03 | Toshiba Corp | 荷電粒子線照射装置 |
| US7948185B2 (en) | 2004-07-09 | 2011-05-24 | Energetiq Technology Inc. | Inductively-driven plasma light source |
| US8143790B2 (en) | 2004-07-09 | 2012-03-27 | Energetiq Technology, Inc. | Method for inductively-driven plasma light source |
| JP2013024558A (ja) * | 2011-07-14 | 2013-02-04 | Hamamatsu Photonics Kk | 電子線照射装置及び電子線透過ユニット |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5782954A (en) * | 1980-11-11 | 1982-05-24 | Nec Corp | X-ray window |
-
1985
- 1985-01-14 JP JP450585A patent/JPS61163547A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5782954A (en) * | 1980-11-11 | 1982-05-24 | Nec Corp | X-ray window |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02253598A (ja) * | 1989-03-27 | 1990-10-12 | Nichicon Corp | Ｘ線発生装置 |
| JP2008506238A (ja) * | 2004-07-09 | 2008-02-28 | エナジェティック・テクノロジー・インコーポレーテッド | 誘導駆動プラズマ光源 |
| US7948185B2 (en) | 2004-07-09 | 2011-05-24 | Energetiq Technology Inc. | Inductively-driven plasma light source |
| US8143790B2 (en) | 2004-07-09 | 2012-03-27 | Energetiq Technology, Inc. | Method for inductively-driven plasma light source |
| JP2011019675A (ja) * | 2009-07-15 | 2011-02-03 | Toshiba Corp | 荷電粒子線照射装置 |
| JP2013024558A (ja) * | 2011-07-14 | 2013-02-04 | Hamamatsu Photonics Kk | 電子線照射装置及び電子線透過ユニット |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0372183B2 (enrdf_load_stackoverflow) | 1991-11-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |