JPS61155430A - プラズマ処理方法 - Google Patents

プラズマ処理方法

Info

Publication number
JPS61155430A
JPS61155430A JP27433284A JP27433284A JPS61155430A JP S61155430 A JPS61155430 A JP S61155430A JP 27433284 A JP27433284 A JP 27433284A JP 27433284 A JP27433284 A JP 27433284A JP S61155430 A JPS61155430 A JP S61155430A
Authority
JP
Japan
Prior art keywords
plasma
gas
different
plasma treatment
processing chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27433284A
Other languages
English (en)
Japanese (ja)
Other versions
JPH046214B2 (enExample
Inventor
Junichi Kasai
純一 河西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Isuzu Motors Ltd
Original Assignee
Isuzu Motors Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Isuzu Motors Ltd filed Critical Isuzu Motors Ltd
Priority to JP27433284A priority Critical patent/JPS61155430A/ja
Publication of JPS61155430A publication Critical patent/JPS61155430A/ja
Publication of JPH046214B2 publication Critical patent/JPH046214B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
JP27433284A 1984-12-28 1984-12-28 プラズマ処理方法 Granted JPS61155430A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27433284A JPS61155430A (ja) 1984-12-28 1984-12-28 プラズマ処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27433284A JPS61155430A (ja) 1984-12-28 1984-12-28 プラズマ処理方法

Publications (2)

Publication Number Publication Date
JPS61155430A true JPS61155430A (ja) 1986-07-15
JPH046214B2 JPH046214B2 (enExample) 1992-02-05

Family

ID=17540177

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27433284A Granted JPS61155430A (ja) 1984-12-28 1984-12-28 プラズマ処理方法

Country Status (1)

Country Link
JP (1) JPS61155430A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10310652A (ja) * 1997-05-14 1998-11-24 Toppan Printing Co Ltd 表面処理方法、その被処理物および表面処理装置
JP2008547166A (ja) * 2005-06-24 2008-12-25 ソフタル エレクトロニック エリック ブルーメンフェルト ゲーエムベーハ− ウント コー カーゲー 製品、特にプレート材または棒材を大気圧で連続的にプラズマ処理およびプラズマコーティングの少なくともいずれかをする方法
JP2016129138A (ja) * 2016-01-22 2016-07-14 沖野　晃俊 プラズマ処理装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS515869A (en) * 1974-07-02 1976-01-19 Torao Tobisu Ekitaino seidenjokasochi
JPS59126437A (ja) * 1983-01-07 1984-07-21 Unitika Ltd シ−ト状物の低温プラズマ処理方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS515869A (en) * 1974-07-02 1976-01-19 Torao Tobisu Ekitaino seidenjokasochi
JPS59126437A (ja) * 1983-01-07 1984-07-21 Unitika Ltd シ−ト状物の低温プラズマ処理方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10310652A (ja) * 1997-05-14 1998-11-24 Toppan Printing Co Ltd 表面処理方法、その被処理物および表面処理装置
JP2008547166A (ja) * 2005-06-24 2008-12-25 ソフタル エレクトロニック エリック ブルーメンフェルト ゲーエムベーハ− ウント コー カーゲー 製品、特にプレート材または棒材を大気圧で連続的にプラズマ処理およびプラズマコーティングの少なくともいずれかをする方法
JP2016129138A (ja) * 2016-01-22 2016-07-14 沖野　晃俊 プラズマ処理装置

Also Published As

Publication number Publication date
JPH046214B2 (enExample) 1992-02-05

Similar Documents

Publication Publication Date Title
US6112696A (en) Downstream plasma using oxygen gas mixture
US9737909B2 (en) Machine for the plasma treatment of containers, comprising offset depressurization/pressurization circuits
KR102330725B1 (ko) 저압 툴 교체를 허용하는 얇은 필름 캡슐화 프로세싱 시스템 및 프로세스 키트
KR100219873B1 (ko) 플라즈마 가공을 위한 장치 및 방법
JP2811820B2 (ja) シート状物の連続表面処理方法及び装置
US6849133B2 (en) CVD apparatuses and methods of forming a layer over a semiconductor substrate
US5449294A (en) Multiple valve assembly and process
JPH0438217B2 (enExample)
TW200514866A (en) Processing apparatus and method
KR960008971A (ko) 반도체 처리장치 및 반도체 처리장치의 클리닝방법
JPS61155430A (ja) プラズマ処理方法
EP0120307A2 (en) Apparatus and method for plasma treatment of resin material
US20180294154A1 (en) Surface modification to improve amorphous silicon gapfill
CN113832448B (zh) 一种半导体薄膜沉积设备及半导体镀膜方法
JP2000292301A (ja) 漏れ検査装置及び漏れ検査装置の校正方法
JP2946020B2 (ja) 軟窒化炉の扉開閉時での外気流入防止方法
JPS608049A (ja) プラズマ処理方法
KR920017209A (ko) 멀티챔버 프로세스장치
KR200173020Y1 (ko) 저압화학기상증착장치
JPS5940850A (ja) 管状体内面のプラズマ処理装置
JPH0315531Y2 (enExample)
TWM650424U (zh) 整合型氣體合流分流裝置
JPS608048A (ja) プラズマ処理方法
JPH0348194Y2 (enExample)
JPS61288415A (ja) 減圧ｃｖｄ装置